Integrated circuit and method of designing layout of integrated circuit

ABSTRACT

A method of designing a layout of an integrated circuit (IC) includes placing a first cell in the layout, placing a second cell in the layout adjacent to the first cell at a first boundary between the first and second cells, and generating a plurality of commands executable by a processor to form a semiconductor device based on the layout. The first cell includes a first pattern and a second pattern. The first and second patterns are adjacent to the first boundary, the first and second patterns have different colors, and a first boundary space between the first pattern and the first boundary is different from a second boundary space between the second pattern and the first boundary.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation application of U.S. application Ser.No. 14/868,745, filed on Sep. 29, 2015, which claims priority to and thebenefit of Provisional Application Ser. No. 62/058,432, filed on Oct. 1,2014, and Korean Patent Application No. 10-2015-0085145, filed on Jun.16, 2015, the disclosures of which are incorporated by reference hereinin their entireties.

TECHNICAL FIELD

Exemplary embodiments of the inventive concept relate to an integratedcircuit (IC), and more particularly, to an IC including at least onestandard cell and a method of designing a layout of the IC.

DISCUSSION OF THE RELATED ART

The design of a semiconductor IC includes an operation of converting abehavior model for a chip, and describing an operation to be derivedfrom a semiconductor system into a specific structure model fordescribing connections between required components. Referring to theprocess of designing the semiconductor IC, when a library of cellsincluded in the semiconductor IC may be generated and the semiconductorIC is implemented using the generated library, the time and costinvolved in designing and implementing the semiconductor IC may bereduced.

SUMMARY

According to an exemplary embodiment of the inventive concept, a methodof designing a layout of an integrated circuit (IC) includes placing afirst cell in the layout, placing a second cell in the layout adjacentto the first cell at a first boundary between the first and secondcells, and generating a plurality of commands executable by a processorto form a semiconductor device based on the layout. The first cellincludes a first pattern and a second pattern. The first and secondpatterns are adjacent to the first boundary, the first and secondpatterns have different colors, and a first boundary space between thefirst pattern and the first boundary is different from a second boundaryspace between the second pattern and the first boundary.

According to an exemplary embodiment of the inventive concept, a methodof designing a layout of an IC includes placing a first cell in thelayout. The first cell includes a plurality of first colorless patterns,each satisfying a first space condition. The first space conditioncorresponds to a value of a smallest space between patterns to which asame color is assigned in a first zone adjacent to a first boundary. Themethod further includes placing a second cell in the layout adjacent tothe first cell at the first boundary between the first and second cells.The first zone extends substantially parallel to the first boundary. Themethod further includes generating a plurality of commands executable bya processor to form a semiconductor device based on the layout.

According to an exemplary embodiment of the inventive concept, anintegrated circuit (IC) includes a plurality of cells and a plurality ofpatterns disposed in each of the plurality of cells and adjacent to aboundary at each of the plurality of cells. The plurality of patternshave different colors corresponding respectively to different masks, andrespective boundary spaces between the patterns and the boundary aredifferent from one another.

According to an exemplary embodiment of the inventive concept, astandard cell stored in a standard cell library includes a plurality offirst colorless patterns disposed in a first zone of the standard celladjacent to a first boundary. Each first colorless pattern satisfies afirst space condition. The standard cell further includes a plurality ofsecond colorless patterns disposed in a second zone of the standard celladjacent to a second boundary opposite to the first boundary. Eachsecond colorless pattern satisfies the first space condition, and thefirst space condition corresponds to a value of a smallest space betweenpatterns to which a same color is assigned in the first zone.

According to an exemplary embodiment of the inventive concept, a methodof manufacturing a semiconductor device includes placing a first cell ina layout. The first cell includes at least two patterns disposedadjacent to a first boundary between the first cell and a second cell.The method further includes placing the second cell in the layoutadjacent to the first cell at the first boundary. The first and secondcells are among a plurality of cells that defines an integrated circuit(IC). The at least two patterns have different colors and respectiveboundary spaces between the at least two patterns and the first boundaryare different from each other. The method further includes forming thesemiconductor device based on the layout. The semiconductor device isformed using a multi-patterning operation performed on the at least twopatterns using different masks corresponding respectively to thedifferent colors.

According to an exemplary embodiment of the inventive concept, a methodof manufacturing a semiconductor device includes placing a first cell ina layout adjacent to a first boundary. The first cell includes a firstzone, and a plurality of first colorless patterns are disposed in thefirst zone. The method further includes placing a second cell in thelayout adjacent to the first boundary. The second cell includes a firstpattern having a first color, and the first and second cells are among aplurality of cells that defines an integrated circuit (IC). The firstcolorless patterns satisfy a first space condition that corresponds to avalue of a smallest space between patterns that are adjacent to thefirst boundary and to which a same color is assigned. The method furtherincludes assigning a second color to the first colorless patterns, andforming the semiconductor device based on the layout. The semiconductordevice is formed using a multi-patterning operation performed on thefirst pattern having the first color and the first colorless patterns towhich the second color is assigned using first and second maskscorresponding respectively to the first and second colors.

According to an exemplary embodiment of the inventive concept, a methodof manufacturing a semiconductor device includes placing a first cell ina layout of an integrated circuit (IC). The first cell includes a firstpattern and a second pattern. The method further includes placing asecond cell in the layout adjacent to the first cell at a boundarybetween the first and second cells. The first and second patterns areadjacent to the boundary, the first and second patterns have differentcolors, and a first boundary space between the first pattern and theboundary is different from a second boundary space between the secondpattern and the boundary. The method further includes forming thesemiconductor device based on the layout. The semiconductor device isformed using a multi-patterning operation performed on the first andsecond patterns using different masks corresponding respectively to thedifferent colors.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features of the present inventive concept willbecome more apparent by describing in detail exemplary embodimentsthereof with reference to the accompanying drawings, in which:

FIG. 1 is a flowchart of a method of manufacturing a semiconductordevice according to an exemplary embodiment of the inventive concept.

FIG. 2 is a flowchart of a method of designing a layout of an integratedcircuit (IC) according to an exemplary embodiment of the inventiveconcept.

FIG. 3 illustrates a portion of an IC including patterns that satisfyfirst and second space conditions, according to an exemplary embodimentof the inventive concept.

FIG. 4 illustrates examples of a method of solving a color conflictaccording to an exemplary embodiment of the inventive concept.

FIG. 5 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

FIG. 6A is a diagram of an example of an IC including a cell that isdesigned according to a comparative example.

FIG. 6B is a diagram of an example of an IC including a cell that isdesigned according to an exemplary embodiment of the inventive concept.

FIGS. 7A to 7F are diagrams of examples of an IC including a cell thatis designed according to an exemplary embodiment of the inventiveconcept.

FIG. 8 is a flowchart of a modified example of a method of designing acell according to an exemplary embodiment of the inventive concept.

FIG. 9 illustrates an example of a cell designed using the method ofFIG. 8 according to an exemplary embodiment of the inventive concept.

FIG. 10 is a diagram of an example of applying a color invertingoperation to an IC according to an exemplary embodiment of the inventiveconcept.

FIG. 11 is a flowchart of a modified example of a method of designing acell according to an exemplary embodiment of the inventive concept.

FIG. 12 illustrates an example of a cell designed using the method shownin FIG. 11 according to an exemplary embodiment of the inventiveconcept.

FIG. 13 illustrates an example of applying a color inverting operationto an IC according to an exemplary embodiment of the inventive concept.

FIG. 14 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

FIG. 15 illustrates an example of an IC including the cell designedusing the method shown in FIG. 14 according to an exemplary embodimentof the inventive concept.

FIG. 16 illustrates an example of a cell designed using the method shownin FIG. 14 according to an exemplary embodiment of the inventiveconcept.

FIG. 17 illustrates an example of applying a color inverting operationto an IC including the cell shown in FIG. 16 according to an exemplaryembodiment of the inventive concept.

FIG. 18 illustrates an example of a cell designed using the method ofFIG. 14 according to an exemplary embodiment of the inventive concept.

FIG. 19 illustrates an example of applying a color inverting operationto an IC including the cell shown in FIG. 18 according to an exemplaryembodiment of the inventive concept.

FIG. 20 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

FIG. 21 illustrates an example of an IC including a cell designed usingthe method shown in FIG. 20 according to an exemplary embodiment of theinventive concept.

FIG. 22 illustrates an example of applying a color inverting operationto an IC including the cell designed using the method shown in FIG. 20according to an exemplary embodiment of the inventive concept.

FIG. 23 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

FIG. 24 illustrates an example of an IC including the cell designedusing the method shown in FIG. 23 according to an exemplary embodimentof the inventive concept.

FIG. 25 illustrates an example of applying a color inverting operationto an IC including the cell designed using the method shown in FIG. 23according to an exemplary embodiment of the inventive concept.

FIG. 26 illustrates an example of a layout of an IC including a celldesigned using a method according to an exemplary embodiment of theinventive concept.

FIG. 27 is a flowchart of a method of designing an IC according to anexemplary embodiment of the inventive concept.

FIG. 28 illustrates a method of assigning colors to colorless patternsaccording to an exemplary embodiment of the inventive concept.

FIG. 29 illustrates an example in which three colors are assigned tofour colorless patterns according to an exemplary embodiment of theinventive concept.

FIG. 30 illustrates an example of an IC including a cell designed usingthe method of FIG. 27 according to an exemplary embodiment of theinventive concept.

FIG. 31 is a flowchart of a method of designing an IC according to anexemplary embodiment of the inventive concept.

FIG. 32 illustrates an example of an IC including a cell designed usingthe method of FIG. 31 according to an exemplary embodiment of theinventive concept.

FIG. 33 illustrates an example of a layout of the IC including a celldesigned using a method according to an exemplary embodiment of theinventive concept.

FIG. 34 illustrates an example of a standard cell including a celldesigned according to an exemplary embodiment of the inventive concept.

FIG. 35 is a perspective view of an example of a semiconductor devicehaving a layout of FIG. 34 according to an exemplary embodiment of theinventive concept.

FIG. 36 is a cross-sectional view taken along line A-A′ of FIG. 34according to an exemplary embodiment of the inventive concept.

FIG. 37 is a perspective view of an example of a semiconductor devicehaving the layout of FIG. 34 according to an exemplary embodiment of theinventive concept.

FIG. 38 is a cross-sectional view taken along line A-A′ of FIG. 37according to an exemplary embodiment of the inventive concept.

FIG. 39 is a block diagram of a storage medium according to an exemplaryembodiment of the inventive concept.

FIG. 40 is a block diagram of a memory card including an IC according toan exemplary embodiment of the inventive concept.

FIG. 41 is a block diagram of a computing system including an ICaccording to an exemplary embodiment of the inventive concept.

DETAILED DESCRIPTION

Exemplary embodiments of the present inventive concept will now bedescribed more fully hereinafter with reference to the accompanyingdrawings. Like reference numerals may refer to like elements throughoutthe drawings. In the drawings, the thicknesses of layers and regions maybe exaggerated for clarity.

The terminology used herein is for the purpose of describing particularexemplary embodiments only and is not intended to be limiting of theinventive concept. As used herein, the singular forms “a”, “an” and“the” are intended to include the plural forms as well, unless thecontext clearly indicates otherwise.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, components, regions, layersand/or sections, these elements, components, regions, layers and/orsections should not be limited by these terms. Thus, a first element,component, region, layer or section discussed below could be termed asecond element, component, region, layer or section without departingfrom the teachings of the inventive concept.

It will be understood that when a component, such as a film, a region, alayer, or an element, is referred to as being “on”, “connected to”,“coupled to”, or “adjacent to” another component, it can be directly on,connected, coupled, or adjacent to the other component, or interveningcomponents may be present. It will also be understood that when acomponent is referred to as being “between” two components, it can bethe only component between the two components, or one or moreintervening components may also be present.

Spatially relative terms, such as “beneath”, “below”, “lower”, “under”,“above”, “upper”, “to the left of”, “to the right of”, etc., may be usedherein for ease of description to describe one element or feature'srelationship to another element(s) or feature(s) as illustrated in thefigures. It will be understood that the spatially relative terms areintended to encompass different orientations of the device in use oroperation in addition to the orientation depicted in the figures. Forexample, if the device in the figures is turned over, elements describedas “below” or “beneath” or “under” other elements or features would thenbe oriented “above” the other elements or features. Thus, the exemplaryterms “below” and “under” can encompass both an orientation of above andbelow.

As used herein, the term “and/or” includes any and all combinations ofone or more of the associated listed items. Further, when two or moreelements or values are described as being substantially the same as orabout equal to each other, it is to be understood that the elements orvalues are identical to each other, indistinguishable from each other,or distinguishable from each other but functionally the same as eachother as would be understood by a person having ordinary skill in theart. Further, when processes are described as being performed atsubstantially the same time, it is to be understood that the processesmay be performed at exactly the same time or at about the same time aswould be understood by a person having ordinary skill in the art.

An integrated circuit (IC) may be defined by a plurality of cells. Forexample, the IC may be designed using a cell library includingcharacteristic information regarding the plurality of cells. Here,names, dimensions, gate widths, pins, delay characteristics, leakagecurrents, critical voltages, and functions of cells may be defined inthe cell library. A general cell library set may include basic cells(e.g., AND, OR, NOR, or inverters), complex cells (e.g., OR/AND/INVERTER(OAI) and AND/OR/INVERTER (AOI)), and storage elements (e.g.,master-slaver flip-flops and latches).

In the following exemplary embodiments, the cell library may be astandard cell library. A standard cell method may be a method ofpreviously preparing logic circuit blocks (or cells) having severalfunctions and designing an exclusive large-scale integrated circuit(LSI) according to customer's specifications or user's specifications byarbitrarily combining the cells. The cells may be previously designedand verified and registered in computers, and logic design, placement,and routing processes may be performed by combining cells by using acomputer-aided design (CAD).

For example, when LSIs are designed and manufactured, if standardizedlogic circuit blocks are already retained on a certain scale, a logiccircuit block fit for a current design purpose may be selected out ofthe standardized logic circuit blocks and placed as a plurality ofcolumns of cells on a chip. Further, the entire circuit may bemanufactured by optimally routing lines having the shortest routinglength in a routing space between cells. As types of cells retained inthe library become more diverse, flexibility in design may increase, andthe possibility of optical design of chips may become stronger.

ICs using standard cells, which are semi-custom ICs, may be previouslydesigned and embodied by placing cells to use standard cells stored in astandard cell library and minimizing routing between the standard cells.Accordingly, the ICs may be developed at low cost within small durationsof time as compared with full-custom ICs.

FIG. 1 is a flowchart of a method of manufacturing a semiconductordevice according to an exemplary embodiment of the inventive concept.

Referring to FIG. 1, a method of manufacturing a semiconductor deviceaccording to an exemplary embodiment may be divided into an operation ofdesigning an IC (S10) and an operation of manufacturing an IC (S20). Theoperation of designing the IC (S10), which includes operations S11 andS13, corresponds to designing a layout of the IC, and may be performedusing a tool for designing ICs. The tool for designing the ICs may be,for example, a program including a plurality of commands that areperformed by a processor. The operation of manufacturing the IC (S20)corresponds to manufacturing a semiconductor device according to the ICbased on the designed layout, and may be performed by a semiconductorprocess module. For example, according to exemplary embodiments, oncethe operation of designing the IC (S10) has been completed, a pluralityof commands executable by a processor to manufacture the IC may begenerated based on the layout designed in operation S10.

In operation S11, a standard cell library may be provided. The standardcell library may include information regarding a plurality of standardcells and may be stored in a computer-readable storage medium. Thestandard cell library may include, for example, layout information andtiming information regarding standard cells.

In an exemplary embodiment, providing the standard cell library mayinclude generating the standard cell library, and more specifically,designing the standard cells. The designing of the standard cells mayinclude, for example, designing a plurality of patterns by using aplurality of colors corresponding to a plurality of masks due to colordecomposition.

In operation S13, a layout of the IC may be designed by placing androuting the standard cells using the standard cell library. For example,input data for defining the IC may be received. The input data may bedata generated by synthesizing an abstract type of behavior of the ICsuch as, for example, data defined by a register transfer level (RTL),using the standard cell library. For example, the input data may be abitstream or a netlist generated by synthesizing an IC defined by ahardware description language (HDL), such as a VHSIC HDL (VHDL) andVERILOG.

A storage medium configured to store the standard cell library may beaccessed, and standard cells from among the plurality of standard cellsstored in the standard cell library, which are selected based on theinput data, may be placed and routed. Here, a placing and routing (P&R)operation refers to an operation of placing the selected standard cellsand connecting the placed standard cells. The layout of the IC may begenerated by completing the P&R operation.

The operation S10 of designing the IC may include the above-describedoperations S11 and S13. However, exemplary embodiments of the inventiveconcept are not limited thereto. For example, operation S10 of designingthe IC may further include various operations performed when designingan IC such as, for example, an operation of revising a standard celllibrary, an operation of verifying a layout, and a post simulationoperation.

In operation S20, a semiconductor device in accordance with the IC maybe formed based on the layout of the IC. For example, initially, thelayout of the IC may be changed by performing an optical proximitycorrection (OPC) operation based on the layout of the IC. Here, the OPCoperation refers to a process of changing a layout of an IC based onerrors caused by an optical proximity effect (OPE). If a mask ismanufactured using the layout of the IC as it is (e.g., without beingchanged based on errors) and a photolithography process is performedusing the manufactured mask, a pattern having a different shape from thedesigned layout may be formed due to an OPE. Accordingly, when thelayout of the IC is changed based on errors caused by the OPE, a mask ismanufactured based on the changed layout, and a photolithography processis performed using the mask, a pattern having the same shape as thelayout may be formed.

Subsequently, a mask may be manufactured according to the layout that ischanged based on the OPC result, and an IC may be formed using themanufactured mask. In this case, the mask may be manufactured using thelayout that is based on the OPC operation, for example, a graphic designsystem (GDS) that is based on the OPC operation, and an IC may bemanufactured on a wafer by performing a photolithography process usingthe manufactured mask. The number of manufactured masks may correspondto the number of colors assigned to patterns included in the layout.

FIG. 2 is a flowchart of a method of designing a layout of an ICaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 2, the method of designing a layout of an IC accordingto an exemplary embodiment may correspond to an example of operation S10of FIG. 1. Accordingly, for convenience of explanation, a furtherdescription of processes and elements previously described withreference to FIG. 1 may be omitted herein.

In operation S200, a first cell may be designed such that patternsadjacent to a first boundary have different colors and differentboundary spaces. Operation S200 may be an example of operation S11 ofFIG. 1. According to an exemplary embodiment, the first cell may bedesigned such that at least two of the patterns adjacent to the firstboundary have different colors and different boundary spaces.Accordingly, some of the patterns adjacent to the first boundary mayhave the same colors or the same boundary spaces.

One cell may be defined by a cell boundary including four boundarylines. Herein, the four boundary lines may also be referred to asboundaries. Thus, the cell boundary may be an outline defining a cell,and a P&R tool may recognize the cell by using the cell boundary. Thefirst boundary may be one of the four boundaries. In an exemplaryembodiment, the first boundary may be one of two boundaries in whichpower lines are not arranged (e.g., which are not parallel to the powerlines), from among the four boundaries.

The patterns adjacent to the first boundary may refer to patterns orfeatures arranged more adjacent to the first boundary than a secondboundary arranged opposite the first boundary, from among a plurality ofpatterns constituting one layer of a first cell. In an exemplaryembodiment, the patterns adjacent to the first boundary may be disposeddirectly adjacent to the first boundary. For example, other patterns maynot be disposed between the first boundary and the patterns adjacent tothe first boundary.

The plurality of patterns constituting one layer of the first cell maybe formed using a plurality of masks in consideration of a patterningresolution. For example, in an operation of designing a cell, aplurality of patterns may be designed using a plurality of colorsrespectively corresponding to a plurality of masks due to colordecomposition. For example, different colors may be assigned to thepatterns formed using different masks. In an exemplary embodiment, atleast two of the patterns adjacent to the first boundary may berespectively assigned to different colors.

A boundary space may refer to a space between the first boundary and thepatterns adjacent to the first boundary. In an exemplary embodiment, anextension direction of the patterns may be substantially parallel to thefirst boundary. In this case, the boundary space may refer to aside-to-side space. In an exemplary embodiment, the extension directionof the patterns may be substantially perpendicular to the firstboundary. In this case, the boundary space may refer to a side-to-tipspace. In an exemplary embodiment, the side-to-tip space may be set tobe greater than the side-to-side space. Various exemplary embodimentsrelated to the boundary space will be described in detail with referenceto FIGS. 7A to 7F.

In operation S220, first and second cells may be placed adjacent to eachother at the first boundary. For example, the first cell may beinitially placed, and the second cell may be placed adjacent to thefirst boundary of the first cell according to a direction in which thefirst cell is placed. In an exemplary embodiment, the first and secondcells may be placed directly adjacent to each other. Operation S220 maybe an example of operation S13 of FIG. 1. The second cell may be anarbitrary cell stored in a standard cell library.

In an exemplary embodiment, the second cell may be a cell designedaccording to operation S200. For example, patterns adjacent to oneboundary of the second cell may have different colors and differentboundary spaces, and patterns adjacent to another boundary arrangedopposite the one boundary of the second cell may have the same color andthe same boundary space. Alternatively, patterns adjacent to anotherboundary of the second cell may have different colors and differentboundary spaces.

In an exemplary embodiment, the second cell may be a cell that is notdesigned according to operation S200. For example, patterns adjacent toone boundary of the second cell may have the same color and the sameboundary space, and patterns adjacent to another boundary arrangedopposite the one boundary of the second cell may also have the samecolor and the same boundary space.

In an exemplary embodiment, the first and second cells may be placeddirectly adjacent to the first boundary. In this case, the firstboundary may substantially overlap one boundary of the second cell. Inan exemplary embodiment, the second cell may be adjacent to the firstboundary and placed a predetermined space apart from the first boundary.

In operation S240, it may be determined whether a space between patternsincluded in the first cell and patterns included in the second cellsatisfies first and second space conditions. For example, it may bedetermined whether a space between patterns adjacent to the firstboundary in the first cell and patterns adjacent to the first boundaryin the second cell satisfies the first and second space conditions. Ifthe result is that the space does not satisfy the first and second spaceconditions, operation S260 may be performed. Otherwise, if the spacesatisfies the first and second space conditions, the method of designingthe layout of the IC may be completed. Herein, when a space betweenpatterns is described as satisfying a space condition, it is to beunderstood that a value of the space that satisfies the space conditionis equal to or greater than a value corresponding to the spacecondition.

A first space, which refers to the smallest space between patterns inthe layout assigned to the same color, may be preset in an operation ofdesigning a layout of an IC. An operation of determining whether thespace satisfies the first space condition may include determiningwhether a space between the patterns adjacent to the first boundary inthe first cell and patterns assigned to the same color, from among thepatterns adjacent to the first boundary in the second cell, is the firstspace or a larger space.

A second space refers to the smallest space between patterns in thelayout assigned to different colors. An operation of determining whetherthe space satisfies the second space condition may include determiningwhether a space between the patterns adjacent to the first boundary inthe first cell and patterns assigned to different colors, from among thepatterns adjacent to the first boundary in the second cell, is thesecond space or a larger space. In this case, the second space issmaller than the first space.

In operation S260, a color inverting operation may be performed on thepatterns included in the second cell. The color inverting operation maybe an operation of swapping different colors (e.g., first and secondcolors), which are previously assigned to the patterns, for one another.The color inverting operation may be referred to as a color swappingoperation. To satisfy the first and second space conditions, a color ofpatterns to which the first color is assigned may be inverted from thefirst color into the second color, and a color of patterns to which thesecond color is assigned may be inverted from the second color into thefirst color. The color inverting operation will be described in detailwith reference to an IC 43 shown in FIG. 4.

FIG. 3 illustrates a portion of an IC 30 including patterns that satisfyfirst and second space conditions, according to an exemplary embodimentof the inventive concept.

Referring to FIG. 3, the IC 30 may include first patterns 31 and 32 towhich a first color is assigned (as indicated by PT1 in FIG. 3) and asecond pattern 33 to which a second color is assigned (as indicated byPT2 in FIG. 3). In this case, the first color and the second color maybe different colors. Thus, the first patterns 31 and 32 and the secondpattern 33 may be formed using different masks. Herein, in the figures,PT1 indicates that the first color has been assigned to thecorresponding pattern and PT2 indicates that the second color has beenassigned to the corresponding pattern.

For example, the first patterns 31 and 32 having the first color may betransferred to a first mask, and the second pattern 33 having the secondcolor may be transferred to a second mask. The first and second masksmay be, for example, lithography masks having transparent patternsconfigured to allow transmission of light and opaque patterns configuredto block light. The first and second masks may be combined with eachother and form a double patterning mask set. The first and second masksmay be used to expose photoresist for patterns of the same type arrangedat the same level.

A space between the two first patterns 31 and 32 to which the firstcolor is assigned may be a first space S1. The first patterns 31 and 32may satisfy the first space conditions. As described above withreference to FIG. 2, the first space (e.g., S1) may be the smallestspace between patterns assigned to the same color. For example, thefirst space S may be 100. Herein, the first space S1 may be expressed inarbitrary unit (a.u.), for example, nm, mm, μm or the like. Hereinafter,a case in which the first space S1 is 100 will be described in detail.

A space between the first pattern 31 to which the first color isassigned and the second pattern 33 to which the second color is assignedmay be a second space S2 or a larger space. The first pattern 31 and thesecond pattern 33 may satisfy the second space condition. Further, aspace between the first pattern 32 to which the first color is assignedand the second pattern 33 to which the second color is assigned may bethe second space S2 or a larger space. The first pattern 32 and thesecond pattern 33 may satisfy the second space condition. As describedabove with reference to FIG. 2, the second space (e.g., S2) may be thesmallest space between the patterns to which different colors areassigned. For example, the second space S2 may be 50. Herein, the secondspace S2 may be expressed in arbitrary unit (a.u.), for example, nm, mm,μm or the like. Hereinafter, a case in which the second space S2 is 50will be described in detail.

In an exemplary embodiment, the first patterns 31 and 32 and the secondpattern 33 may be included in one cell. In an exemplary embodiment, thefirst pattern 31 may be included in the first cell, and the firstpattern 32 and the second pattern 33 may be included in the second cell.Thus, in the IC 30, the first and second patterns 31, 32, and 33 may bearranged in the same cell and in adjacent cells to satisfy the first andsecond space conditions.

FIG. 4 illustrates examples of a method of solving a color conflictaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 4, an IC 41 may include first to third standard cellsSC1, SC2, and SC3 placed adjacent to one another. The first standardcell SC1 may include a first pattern 411 having a first color and asecond pattern 412 having a second color. The second standard cell SC2may include a first pattern 413 having the first color and a secondpattern 414 having the second color. The third standard cell SC3 mayinclude a second pattern 415 having the second color and a first pattern416 having the first color.

The first and second standard cells SC1 and SC2 may be adjacent to afirst boundary BD1. The second pattern 412 included in the firststandard cell SC1 adjacent to the first boundary BD1 and the firstpattern 413 included in the second standard cell SC2 adjacent to thefirst boundary BD1 may have different colors. Accordingly, it may bedetermined whether the second pattern 412 and the first pattern 413satisfy the second space condition. For example, it may be determinedwhether a distance D0 between the second pattern 412 and the firstpattern 413 is 50 or more. Herein, the distance D0 may be expressed inarbitrary unit (a.u.), for example, nm, mm, μm or the like.

The second and third standard cells SC2 and SC3 may be adjacent to thesecond boundary BD2. The second pattern 414 included in the secondstandard cell SC2 adjacent to the second boundary BD2 may have the samecolor as the second pattern 415 included in the third standard cell SC3adjacent to the second boundary BD2. Accordingly, it may be determinedwhether the second pattern 414 and the second pattern 415 satisfy thefirst space condition. For example, it may be determined whether adistance D1 between the second pattern 414 and the second pattern 415 is100 or more. Herein, the distance D1 may be expressed in arbitrary unit(a.u.), for example, nm, mm, μm or the like.

In the present example, the distance between the second pattern 414 andthe second pattern 415 is less than the first space S1. Thus, the secondpattern 414 and the second pattern 415 do not satisfy the first spacecondition. As described above, when a distance between two patterns towhich the same color is assigned does not satisfy the first spacecondition, a color violation occurs between the two patterns. In anoperation of placing and routing standard cells defining an IC, a colorconflict may occur due to the color violation.

In an IC 42, a third standard cell SC3 may be placed a predetermineddistance d apart from the second standard cell SC2 to solve a colorconflict. Thus, a distance D1′ between the second pattern 414 and thesecond pattern 415 may be the first space S1 or a larger space. Thus,the second pattern 414 and the second pattern 415 may satisfy the firstspace condition. According to the above-described cell spacing method,an area of the IC 42 may be increased.

In an IC 43, a color inverting operation may be performed on first andsecond patterns 415 and 416 included in a third standard cell SC3 tosolve a color conflict. As a result of the color inverting operation, asecond pattern 415′ may have a first color, and a first pattern 416′ mayhave a second color. Thus, since the second pattern 414 and the secondpattern 415′ have different colors, the second pattern 414 and thesecond pattern 415′ may satisfy the second space condition. In thepresent example, a distance D1 between the second pattern 414 and thesecond pattern 415′ may be the second space S2 or a larger space. Thus,the second pattern 414 and the second pattern 415′ may satisfy thesecond space condition.

FIG. 5 is a flowchart of a method S200A of designing a cell according toan exemplary embodiment of the inventive concept.

Referring to FIG. 5, the method S200A of designing the cell according toan exemplary embodiment may correspond to an example of operation S200of FIG. 2. Accordingly, for convenience of explanation, a furtherdescription of processes and elements previously described withreference to FIG. 2 may be omitted herein.

In operation S500, first and second colors may be respectively assignedto first and second patterns. The first and second colors may bedifferent colors and may respectively correspond to first and secondmasks. The first and second patterns may be different patterns includedin the same layer. Hereinafter, a pattern to which the first color isassigned will be referred to as the first pattern, and a pattern towhich the second color is assigned will be referred to as the secondpattern.

In an exemplary embodiment, since color decomposition is performed usingtwo colors (e.g., the first and second colors), the first and secondpatterns may be formed using two masks. Accordingly, the first andsecond patterns according to an exemplary embodiment may be formed usingdouble patterning technology (DPT).

In operation S520, a first boundary space may be determined based on afirst space. The first space may be the smallest distance betweenpatterns assigned to the same color. The first boundary space may be aspace between a first pattern adjacent to a first boundary and the firstboundary. Herein, when a boundary space is described as being determinedbased on certain factors, it is understood that a value of the boundaryspace is being set based on the certain factors.

In operation S540, a second boundary space may be determined based on asecond space to be different from the first boundary space. The secondspace may be the smallest space between patterns assigned to differentcolors. The second boundary space may be a space between a secondpattern adjacent to the first boundary and the first boundary. In anexemplary embodiment, the second boundary space may be determined to beless than the first boundary space.

Referring to a general operation of designing a cell, cells to be placedadjacent to each other cannot typically be predicted. According toexemplary embodiment of the inventive concept, the first and secondboundary spaces may be determined in two cells placed adjacent to eachother at the first boundary such that patterns arranged on two sides ofthe first boundary satisfy first and second space conditions. The firstand second boundary spaces satisfying first and second space conditionsmay be referred to herein as a boundary rule.

FIG. 6A illustrates an example of an IC including a cell designedaccording to a comparative example.

Referring to FIG. 6A, an IC 61 may include first and second standardcells 601 and 602 placed adjacent to a first boundary BD1. The firststandard cell 601 may include first patterns 601 a and 601 b to which afirst color is assigned. A distance bf between the first pattern 601 aand the first boundary BD1 may be equal to a distance bf between thefirst pattern 601 b and the first boundary BD1. For example, thedistance bf may be 25. Herein, the distance bf may be expressed inarbitrary unit (a.u.), for example, nm, mm, μm or the like. The secondstandard cell 602 may include a first pattern 602 a to which the firstcolor is assigned and a second pattern 602 b to which a second color isassigned. A distance bs between the first pattern 602 a and the firstboundary BD1 may be equal to a distance bs between the second pattern602 b and the first boundary BD1. For example, the distance bs may be75. Herein, the distance bs may be expressed in arbitrary unit (a.u.),for example, nm, mm, μm or the like.

Since the first pattern 601 a and the first pattern 602 a arranged ontwo sides of the first boundary BD1 have the same color, the firstpatterns 601 a and 602 a should satisfy the first space condition. Inthe present example, since a distance between the first pattern 601 aand the first pattern 602 a is 100, the first patterns 601 a and 602 asatisfy the first space condition. Since the first pattern 601 b and thesecond pattern 602 b arranged on two sides of the first boundary BD1have different colors, the first pattern 601 b and the second pattern602 b should satisfy the second space condition. In the present example,since a distance between the first pattern 601 b and the second pattern602 b is 100, the first pattern 601 b and the second pattern 602 bsatisfies the second space condition. However, since a distance (e.g.,100) between the first pattern 601 b and the second pattern 602 b ismuch larger than the second space S2 (e.g., 50e.g.), spatial efficiencymay be degraded.

FIG. 6B illustrates an example of an IC including a cell designedaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 6B, an IC 62 may include first and second standardcells 611 and 612 placed adjacent to each other at a first boundary BD1.The first standard cell 611 may include first patterns 611 a and 611 bto which a first color is assigned. A distance Bf between the firstpattern 611 a and the first boundary BD1 may be equal to a distance Bfbetween the first pattern 611 b and the first boundary BD1. For example,the distance Bf may be 25. The second standard cell 612 may include afirst pattern 612 a to which the first color is assigned and a secondpattern 612 b to which a second color is assigned. A first boundaryspace B1 between the first pattern 612 a and the first boundary BD1 maydiffer from a second boundary space B2 between the second pattern 612 band the first boundary BD1.

The second boundary space B2 may be determined to be smaller than thefirst boundary space B1. For example, the first boundary space B1 may be75, and the first boundary space B2 may be 25. Accordingly, since aspace between the first pattern 611 b and the second pattern 612 b thatare arranged on two sides of the first boundary BD1 and have differentcolors is 50, the first pattern 611 b and the second pattern 612 bsatisfies the second space condition and spatial efficiency may beimproved.

A space RS′ between a second boundary BD2 arranged opposite the firstboundary BD1 and the second pattern 612 b in the second standard cell612 included in the IC 62 may be greater than a space RS between thesecond boundary BD2 arranged opposite the first boundary BD1 and thesecond pattern 602 b in the second standard cell 602 included in the IC61. Accordingly, in an exemplary embodiment, other patterns may bearranged in the space RS′ in the second standard cell 612. That is, inexemplary embodiments, the additional space RS′ in the second standardcell 612 may be utilized for other patterns. In an exemplary embodiment,a lengthwise size of the second standard cell 612 may be reduced. Thus,according to an exemplary embodiment, the area utilized in standardcells may be optimized with an increase in the space RS′.

FIGS. 7A to 7F illustrate examples of an IC including a cell designedaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 7A, an IC 71 may include first and second standardcells 711 and 712 placed adjacent to each other at a first boundary BD1.The first standard cell 711 may include a first pattern 711 a to which afirst color is assigned and a second pattern 711 b to which a secondcolor is assigned. The second standard cell 712 may include a firstpattern 712 a to which the first color is assigned.

A direction in which the first and second patterns 711 a and 711 bextend in the first standard cell 711 may be substantially parallel tothe first boundary BD1. In this case, the first and second patterns 711a and 711 b may be referred to as vertical patterns. A first boundaryspace B1, which is a space between the first pattern 711 a and the firstboundary BD1, may differ from a second boundary space B2, which is aspace between the first boundary BD1 and the second pattern 711 b. Thefirst boundary space B1 may be greater than the second boundary spaceB2.

Since the first color is assigned to the first pattern 7111 a and 712 aarranged on two sides of the first boundary BD1, the first patterns 711a and 712 a should satisfy a first space condition. In this case, aspace between the first patterns 711 a and 712 a (e.g., the sum of aspace Bf between the first pattern 712 a and the first boundary BD1 andthe first boundary space B1) may be a side-to-side space and may beequal to or greater than a first space S1.

Since the first and second colors are respectively assigned to the firstpattern 712 a and the second pattern 711 b arranged on two sides of thefirst boundary BD1, the first pattern 712 a and the second pattern 711 bshould satisfy a second space condition. In this case, a space betweenthe first and second patterns 712 a and 711 b (e.g., the sum of a spaceBf between the first pattern 712 a and the first boundary BD1 and thesecond boundary space B2) may be a side-to-side space and may be equalto or greater than a second space S2.

Referring to FIG. 7B, an IC 72 may include first and second standardcells 721 and 712 placed adjacent to each other at a first boundary BD1.The first standard cell 721 may include a first pattern 721 a to whichthe first color is assigned and a second pattern 711 b to which thesecond color is assigned. The second standard cell 712 may include afirst pattern 712 a to which the first color is assigned. The IC 72 mayhave substantially the same configuration as the IC 71 of FIG. 7A exceptfor the first pattern 721 a included in the first standard cell 721.

An extension direction of the first pattern 721 a included in the firststandard cell 721 may be substantially perpendicular to the firstboundary BD1, and an extension direction of the second pattern 711 b maybe substantially parallel to the first boundary BD1. In this case, thefirst pattern 721 a may be referred to as a horizontal pattern, and thesecond pattern 711 b may be referred to as a vertical pattern. A firstboundary space B1′ may be greater than the first boundary space B1 shownin FIG. 7A.

Since the first color is assigned to the first patterns 721 a and 712 aarranged on two sides of the first boundary BD1, the first pattern 721 aand 712 a should satisfy the first space condition. In this case, aspace between the first patterns 721 a and 712 a (e.g., the sum of aspace Bf between the first pattern 712 a and the first boundary BD1 andthe first boundary space B1′) may be a side-to-tip space and may begreater than a first space S1′. In this case, the first space S1′ may begreater than the first space S1 of FIG. 7A.

Referring to FIG. 7C, an IC 73 may include first and second standardcells 731 and 712 placed adjacent to each other at a first boundary BD1.The first standard cell 731 may include a first pattern 711 a to whichthe first color is assigned and a second pattern 731 b to which thesecond color is assigned. The second standard cell 712 may include afirst pattern 712 a to which the first color is assigned. The IC 73according may have substantially the same configuration as the IC 71 ofFIG. 7A except for a second pattern 731 b included in the first standardcell 731.

An extension direction of the first pattern 711 a included in the firststandard cell 731 may be substantially parallel to the first boundaryBD1, and an extension direction of the second pattern 731 b may besubstantially perpendicular to the first boundary BD1. A second boundaryspace B2′ may be greater than the second boundary space B2 of FIG. 7A.

Since the first and second colors are respectively assigned to the firstand second patterns 712 a and 731 b arranged on two sides of the firstboundary BD1, the first and second patterns 712 a and 731 b shouldsatisfy a second space condition. In this case, a space between thefirst and second patterns 712 a and 731 b (e.g., the sum of a space Bfbetween the first pattern 712 a and the first boundary BD1 and a secondboundary space B2′) may be a side-to-tip space and may be greater than asecond space S2′. In this case, the second space S2′ may be equal to orgreater than the second space S2 of FIG. 7A.

Referring to FIG. 7D, an IC 74 may include first and second standardcells 741 and 712 placed adjacent to each other at a first boundary BD1.The first standard cell 741 may include a first pattern 721 a to whichthe first color is assigned and a second pattern 731 b to which thesecond color is assigned. The second standard cell 712 may include afirst pattern 712 a to which the first color is assigned. The IC 74 mayhave substantially the same configuration as the IC 71 of FIG. 7A exceptfor the first and second patterns 721 a and 731 b included in the firststandard cell 721.

An extension direction of the first and second patterns 721 a and 731 bincluded in the first standard cell 741 may be substantiallyperpendicular to the first boundary BD1. A first boundary space B1′ maybe greater than the first boundary space B1 of FIG. 7A, and a secondboundary space B2′ may be greater than the second boundary space B2 ofFIG. 7A.

Since the first color is assigned to the first patterns 721 a and 712 aarranged on two sides of the first boundary BD1, the first patterns 721a and 712 a should satisfy a first space condition. In this case, aspace between the first patterns 721 a and 712 a (e.g., the sum of aspace Bf between the first pattern 712 a and the first boundary BD1 anda first boundary space B1′) may be a side-to-tip space and may be equalto or greater than a first space S1′. Since the first and second colorsare respectively assigned to the first and second patterns 712 a and 731b arranged on two sides of the first boundary BD1, the first and secondpatterns 712 a and 731 b should satisfy a second space condition. Inthis case, a space between the first and second patterns 712 a and 731 b(e.g., the sum of a space Bf between the first pattern 712 a and thefirst boundary BD1 and a second boundary space B2′) may be a side-to-tipspace and may be equal to or greater than a second space S2′.

Referring to FIG. 7E, an IC 75 may include first and second standardcells 711 and 752 placed adjacent to each other at a first boundary BD1.The first standard cell 711 may include a first pattern 711 a to whichthe first color is assigned and a second pattern 711 b to which thesecond color is assigned. The second standard cell 752 may include afirst pattern 752 a to which the first color is assigned. The IC 75 mayhave substantially the same configuration as the IC 71 of FIG. 7A exceptfor the first pattern 752 a included in the second standard cell 752.

An extension of the first pattern 752 a included in the second standardcell 752 may be substantially perpendicular to the first boundary BD1,and the first pattern 752 a may be arranged adjacent to the firstpattern 711 a included in the first standard cell 711. A space Bfbetween the first pattern 752 a and the first boundary BD1 may begreater than the space Bf shown in FIG. 7A.

Since the first color is assigned to the first patterns 711 a and 752 aarranged on two sides of the first boundary BD1, the first patterns 711a and 752 a should satisfy a first space condition. In this case, aspace between the first patterns 711 a and 752 a (e.g., the sum of aspace Bf between the first pattern 752 a and the first boundary BD1 anda first boundary space B1) may be a tip-to-side space and may be equalto or greater than a first space S1′.

Referring to FIG. 7F, an IC 76 may include first and second standardcells 711 and 762 placed adjacent to each other at a first boundary BD1.The first standard cell 711 may include a first pattern 711 a to whichthe first color is assigned and a second pattern 711 b to which thesecond color is assigned. The second standard cell 762 may include afirst pattern 752 a′ to which the first color is assigned. The IC 76 mayhave substantially the same configuration as the IC 71 of FIG. 7A exceptfor the first pattern 752 a′ included in the second standard cell 762.

An extension direction of the first pattern 752 a′ included in thesecond standard cell 762 may be substantially perpendicular to the firstboundary BD1, and the first pattern 752 a′ may be arranged adjacent tothe second pattern 711 b included in the first standard cell 711. Aspace Bf between the first pattern 752 a′ and the first boundary BD1 maybe greater than the space Bf shown in FIG. 7A.

Since the first and second colors are respectively assigned to the firstand second patterns 752 a′ and 711 b arranged on two sides of the firstboundary BD1, the first and second patterns 752 a′ and 711 b shouldsatisfy a second space condition. In this case, a space between thefirst and second patterns 752 a′ and 711 b (e.g., the sum of a space BPbetween the first pattern 752 a′ and the first boundary BD1 and a secondboundary space B2) may be a tip-to-side space and may be equal to orgreater than a second space S2′.

FIG. 8 is a flowchart of a modified example of a method of designing acell according to an exemplary embodiment of the inventive concept.

The method of designing a cell according to the exemplary embodiment ofFIG. 8 may be performed after operation S540 of FIG. 5. Accordingly, forconvenience of explanation, a further description of processes andelements previously described with reference to FIG. 5 may be omittedherein.

In operation S800, one of first and second colors may be assigned to apattern arranged adjacent to a second boundary. The second boundary maybe a boundary arranged opposite a first boundary in the same cell. In anexemplary embodiment, operation S800 may be substantially the same asoperation S500 of FIG. 5. For example, the first boundary of FIG. 5 maybe referred to as a right boundary, and first and second patternsadjacent to the first boundary may be referred to as right patterns. Inthis case, the second boundary may be referred to as a left boundary,and patterns adjacent to the second boundary may be referred to as leftpatterns. However, exemplary embodiments of the inventive concept arenot limited thereto. For example, in an exemplary embodiment, the firstboundary may be the left boundary and the second boundary may be theright boundary.

In operation S820, a boundary space between a pattern adjacent to thesecond boundary and the second boundary may be determined as equal to orgreater than the smallest value of first and second boundary spaces. Inthis case, the first boundary space may be a space between a first rightpattern adjacent to the first boundary and the first boundary, and thesecond boundary space may be a space between a second right patternadjacent to the first boundary and the first boundary.

FIG. 9 illustrates an example of a cell designed using the method ofFIG. 8 according to an exemplary embodiment of the inventive concept.

Referring to FIG. 9, the cell 90 may be defined by a cell boundary CBincluding a first boundary BD1 and a second boundary BD2. The firstboundary BD1 may be referred to as a right boundary, and the secondboundary BD2 may be referred to as a left boundary. The cell 90 mayinclude a first right pattern 91 having a first color, a second rightpattern 92 having a second color, and a left pattern 93 having the firstcolor.

A first boundary space B1 between the first right pattern 91 and thefirst boundary BD1 may be greater than a second boundary space B2between the second right pattern 92 and the first boundary BD1. However,exemplary embodiments of the inventive concept are not limited thereto.For example, in an exemplary embodiment, the first boundary space B1between the first right pattern 91 and the first boundary BD1 may beless than the second boundary space B2 between the second right pattern92 and the first boundary BD1.

A left boundary space Bf between the left pattern 93 and the secondboundary BD2 may be determined to be equal to or greater than thesmallest value of the first and second boundary spaces B1 and B2. Thus,in an operation of placing cells, first and second space conditions maybe satisfied between patterns included in a cell to be placed adjacentto the cell 90 on the left side of the cell 90 and the left pattern 93included in the cell 90.

FIG. 10 illustrates an example of applying a color inverting operationto an IC according to an exemplary embodiment of the inventive concept.

Referring to FIG. 10, the IC 101 may include first to fourth standardcells 1001 to 1004 placed along a first direction DR1. The firststandard cell 1001 may include first and second left patterns 1001 a and1001 b and a right pattern 1001 c. A boundary space B2 (e.g., 25) of thefirst left pattern 1001 a may be less than a boundary space B1 (e.g.,75) of the second left pattern 1001 b. A boundary space Bf of the rightpattern 1001 c may be equal to or greater than the smallest value ofleft boundary spaces B1 and B2. For example, the boundary space Bf maybe 25.

The second standard cell 1002 may include first and second left patterns1002 a and 1002 b and a right pattern 1002 c. The boundary space B1(e.g., 75) of the first left pattern 1002 a may be greater than theboundary space B2 (e.g., 25) of the second left pattern 1002 b. Theboundary space Bf of the right pattern 1002 c may be equal to or greaterthan the smallest value of left boundary spaces B1 and B2. For example,the boundary space Bf may be 25.

In this case, since the right pattern 1001 c and the first left pattern1002 a have the same color, a space between the right pattern 1001 c andthe first left pattern 1002 a should satisfy a first space condition. Inthe present example, since a space between the right pattern 1001 c andthe first left pattern 1002 a is 100, the space between the rightpattern 1001 c and the first left pattern 1002 a satisfies a first spacecondition. Further, since the right pattern 1001 c and the second leftpattern 1002 b have different colors, a space between the right pattern1001 c and the second left pattern 1002 b should satisfy a second spacecondition. In the present example, since a space between the rightpattern 1001 c and the second left pattern 1002 b is 50, the spacebetween the right pattern 1001 c and the second left pattern 1002 bsatisfies the second space condition.

The third standard cell 1003 may include first and second right patterns1003 a and 1003 b and a left pattern 1003 c, and the boundary space B1(e.g., 75) of the first right pattern 1003 a may be greater than theboundary space B2 (e.g., 25) of the second right pattern 1003 b. Theboundary space 8 f of the left pattern 1003 c may be equal to or greaterthan the smallest value of the right boundary spaces B1 and B2. Forexample, the boundary space Bf may be 25.

In this case, since the right pattern 1002 c and the left pattern 1003 chave the same color, a space between the right pattern 1002 c and theleft pattern 1003 c should satisfy a first space condition. In thepresent example, since a space between the right pattern 1002 c and theleft pattern 1003 c is 50, the space between the right pattern 1002 cand the left pattern 1003 c does not satisfy the first space condition.Accordingly, a color conflict occurs between the right pattern 1002 cand the left pattern 1003 c.

The fourth standard cell 1004 may include first and second left patterns1004 a and 1004 b and a right pattern 1004 c, and the boundary space B1(e.g., 75) of the first left pattern 1004 a may be greater than theboundary space B2 (e.g., 25) of the second left pattern 1004 b. Theboundary space Bf of the right pattern 1004 c may be equal to or greaterthan the smallest value of the left boundary spaces B1 and B2. Forexample, the boundary space Bf may be 25.

In this case, since the second right pattern 1003 b and the second leftpattern 1004 b have the same color, a space between the second rightpattern 1003 b and the second left pattern 1004 b should satisfy a firstspace condition. In the present example, since a space between thesecond right pattern 1003 b and the second left pattern 1004 b is 50,the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern1003 b and the second left pattern 1004 b.

An IC 102 may perform a color inverting operation on the third standardcell 1003 to solve the color conflict between the second standard cell1002 and the third standard cell 1003, and the color conflict betweenthe third standard cell 1003 and the fourth standard cell 1004. Thus, aleft pattern 1003 c′ and a second right pattern 1003 b′ may be changedfrom a second color into a first color, and a first right pattern 1003a′ may be changed from the first color into the second color.

Thus, the right pattern 1002 c and the left pattern 1003 c′ may havedifferent colors, and a space between the right pattern 1002 c and theleft pattern 1003 c′ may satisfy the second space condition, thussolving the color conflict. Further, the second right pattern 1003 b′and the second left pattern 1004 b may have different colors, and aspace between the second right pattern 1003 b′ and the second leftpattern 1004 b may satisfy the second space condition, thus solving thecolor conflict.

FIG. 11 is a flowchart of a modified example of a method of designing acell according to an exemplary embodiment of the inventive concept.

Referring to FIG. 11, the method of designing the cell according to thepresent exemplary embodiment may be performed after operation S540 ofFIG. 5. Accordingly, for convenience of explanation, a furtherdescription of processes previously described may be omitted herein.

In operation S1100, one of first and second colors may be assigned to apattern adjacent to a second boundary. In an exemplary embodiment, thesecond boundary may be a boundary arranged opposite a first boundary inthe same cell. In an exemplary embodiment, operation S1100 may besubstantially the same as operation S800 of FIG. 8. For example, thefirst boundary of FIG. 5 may be a right boundary, and first and secondpatterns adjacent to the first boundary may be referred to as rightpatterns. In this case, the second boundary may be a left boundary, andpatterns adjacent to the second boundary may be referred to as leftpatterns. However, exemplary embodiments of the inventive concept arenot limited thereto. For example, in an exemplary embodiment, the firstboundary may be the left boundary, and the second boundary may be theright boundary.

In operation S1120, boundary spaces between the patterns adjacent to thesecond boundary and the second boundary may be determined as the samevalue, which is equal to or greater than the smallest value of first andsecond boundary spaces. In this case, the first boundary space may be aspace between a first right pattern adjacent to the first boundary andthe first boundary, and the second boundary space may be space between asecond right pattern adjacent to the first boundary and the firstboundary.

FIG. 12 illustrates an example of a cell designed using the method ofFIG. 11 according to an exemplary embodiment of the inventive concept.

Referring to FIG. 12, the cell 120 may be defined by a cell boundary CBincluding a first boundary BD1 and a second boundary BD2. The firstboundary BD1 may be referred to as the right boundary, and the secondboundary BD2 may be referred to as the left boundary. The cell 120 mayinclude a first right pattern 121 having a first color, a second rightpattern 122 having a second color, and left patterns 123 and 124 havingthe first color. However, exemplary embodiments of the inventive conceptare not limited thereto. For example, in an exemplary embodiment, theleft patterns 123 and 124 may have the second color.

In an exemplary embodiment, a first boundary space B1 between the firstright pattern 121 and the first boundary BD1 may be greater than asecond boundary space B2 between the second right pattern 122 and thefirst boundary BD1. However, exemplary embodiments of the inventiveconcept are not limited thereto. For example, in an exemplaryembodiment, the first boundary space B1 between the first right pattern121 and the first boundary BD1 may be less than the second boundaryspace B2 between the second right pattern 122 and the first boundary B1.

In an exemplary embodiment, a first left boundary space Bf between theleft pattern 123 and the second boundary BD2 may be equal to a secondleft boundary space Bf between the left pattern 124 and the secondboundary BD2. In this case, the first and second left boundary spaces Bfmay be determined to be equal to or greater than the smallest value ofthe first and second boundary spaces B1 and B2. Thus, in an operation ofplacing cells, first and second space conditions may be satisfiedbetween patterns included in a cell to be placed adjacent to a left sideof the cell 120 and the left patterns 123 and 124 included in the cell120.

FIG. 13 illustrates an example of applying a color inverting operationto ICs 32 according to an exemplary embodiment of the inventive concept.

Referring to FIG. 13, an IC 131 may include first to fourth standardcells 1301 to 1304 arranged along a first direction DR1. The firststandard cell 1301 may include first and second left patterns 1301 a and1301 b and first and second right patterns 1301 c and 1301 d. A boundaryspace B1 (e.g., 75) of the first right pattern 1301 c may be greaterthan a boundary space B2 (e.g., 25) of the second right pattern 1301 d.A boundary space Bf of the first and second left patterns 1301 a and1301 b may be equal to or greater than the smallest value of the rightboundary spaces B1 and B2. For example, the boundary space Bf may be 25.

The second standard cell 1302 may include first and second left patterns1302 a and 1302 b and first and second right patterns 1302 c and 1302 d.The boundary space B1 (e.g., 75) of the first right pattern 1302 c maybe greater than the boundary space B2 (e.g., 25) of the second rightpattern 1302 d. The boundary space Bf of the first and second leftpatterns 1302 a and 1302 b may be equal to or greater than the smallestvalue of the right boundary spaces B1 and B2. For example, the boundaryspace Bf may be 25.

In this case, since the first right pattern 1301 c and the first leftpattern 1302 a have the same color, a space between the first rightpattern 1301 c and the first left pattern 1302 a should satisfy a firstspace condition. In the present example, since the space between thefirst right pattern 1301 c and the first left pattern 1302 a is 100, thespace therebetween satisfies the first space condition. Further, sincethe second right pattern 1301 d and the second left pattern 1302 b havedifferent colors, a space between the second right pattern 1301 d andthe second left pattern 1302 b should satisfy a second space condition.In the present example, since a space between the second right pattern1301 d and the second left pattern 1302 b is 50, the space therebetweensatisfies the second space condition.

The third standard cell 1303 may include first and second left patterns1303 a and 1303 b and first and second right patterns 1303 c and 1303 d.A boundary space B1 (e.g., 75) of the first left pattern 1303 a may begreater than a boundary space B2 (e.g., 25) of the second left pattern1303 b. A boundary space Bf of the first and second right patterns 1303c and 1303 d may be equal to or greater than the smallest value of theleft boundary spaces B1 and B2. For example, the boundary space Bf maybe 25.

In this case, since the first right pattern 1302 c and the first leftpattern 1303 a have the same color, a space between the first rightpattern 1302 c and the first left pattern 1303 a should satisfy a firstspace condition. In the present example, since a space between the firstright pattern 1302 c and the first left pattern 1303 a is 150, the spacetherebetween satisfies the first space condition.

Since the second right pattern 1302 d and the second left pattern 1303 bhave the same color, a space between the second right pattern 1302 d andthe second left pattern 1303 b should satisfy a first space condition.In the present example, since the space between the second right pattern1302 d and the second left pattern 1302 b is 50, the space therebetweendoes not satisfy the first space condition. Accordingly, a colorconflict occurs between the second right pattern 1302 d and the secondleft pattern 1303 b.

The fourth standard cell 1304 may include first and second left patterns1304 a and 1304 b and first and second right patterns 1304 c and 1304 d.A boundary space B1 (e.g., 75) of the first right pattern 1304 c may begreater than a boundary space B2 (e.g., 25) of the second right pattern1304 d. A boundary space Bf of the first and second left patterns 1304 aand 1304 b may be equal to or greater than the smallest value of theright boundary spaces B1 and B2. For example, the boundary space Bf maybe 25.

The IC 132 may perform a color inverting operation on the third standardcell 1303 to solve the color conflict between the second standard cell1302 and the third standard cell 1303, and the color conflict betweenthe third standard cell 1303 and the fourth standard cell 1304. Thus, afirst left pattern 1303 a′ and first and second right patterns 1303 c′and 1303 d′ may be changed from a first color into a second color, and asecond left pattern 1303 b′ may be changed from a second color into afirst color.

Thus, the second right pattern 1302 d and the second left pattern 1303b′ may have different colors, and a space between the second rightpattern 1302 d and the second left pattern 1303 b′ may satisfy a secondspace condition, thus solving the color conflict. Further, the firstright pattern 1303 c′ and the first left pattern 1304 a may havedifferent colors, and a space between the first right pattern 1303 c′and the first left pattern 1304 a may satisfy the second spacecondition, thus solving the color conflict. Further, the second rightpattern 1303 d′ and the second left pattern 1304 b may have differentcolors, and a space between the second right pattern 1303 d′ and thesecond left pattern 1304 b may satisfy the second space condition, thussolving the color conflict.

FIG. 14 is a flowchart of a method S200B of designing a cell accordingto an exemplary embodiment of the inventive concept.

Referring to FIG. 14, the method S200B of designing the cell accordingto the present exemplary embodiment may correspond to one example ofoperation S200 of FIG. 2. Accordingly, for convenience of explanation, afurther description of processes and elements previously described withreference to FIG. 2 may be omitted herein.

In operation S1400, first to third colors may be respectively assignedto first to third patterns. The first to third colors may be differentfrom one another and respectively correspond to first to third masks.The first to third patterns may be different patterns included in thesame layer. Hereinafter, a pattern to which a first color is assignedwill be referred to as a first pattern (e.g., PT1), a pattern to which asecond color is assigned will be referred to as a second pattern (e.g.,PT2), and a pattern to which a third color is assigned will be referredto as a third pattern (e.g., PT3).

In an exemplary embodiment, since a color decomposition process isperformed using three colors (e.g., first to third colors), the first tothird patterns may be formed using three masks. Accordingly, the firstto third patterns according to an exemplary embodiment may be formedusing triple patterning technology (TPT).

In operation S1420, a first boundary space may be determined based on afirst space. The first space may be a smallest space between patterns towhich the same color is assigned. The first boundary space may be aspace between the first pattern adjacent to a first boundary and thefirst boundary.

In operation S1440, a second boundary space may be determined to bedifferent from the first boundary space based on a second space. Thesecond space may be the smallest space between patterns to whichdifferent colors are assigned. The second boundary space may be a spacebetween the second pattern adjacent to the first boundary and the firstboundary. In an exemplary embodiment, the second boundary space may bedetermined to be less than the first boundary space.

Referring to a general operation of designing a cell, cells to be placedadjacent to each other cannot typically be predicted. According toexemplary embodiments of the inventive concept, when two cells areplaced adjacent to each other at the first boundary, the first andsecond boundary spaces may be determined such that patterns arranged ontwo sides of the first boundary satisfy the first and second spaceconditions.

In operation S1460, a third boundary space may be determined based onthe first space. In an exemplary embodiment, the third boundary spacemay be equal to or greater than the second boundary space and equal toor less than the first boundary space.

FIG. 15 illustrates an example of an IC including a cell designed usingthe method of FIG. 14.

Referring to FIG. 15, an IC 150 may include first and second standardcells 1501 and 1502 placed adjacent to each other at a first boundaryBD1. The first standard cell 1501 may include first patterns 1501 a and1501 b to which a first color is assigned. A space Bf between the firstpattern 1501 a and the first boundary BD1 may be equal to the space Bfbetween the first pattern 1501 b and the first boundary BD1. Forexample, the space Bf may be 25.

The second standard cell 1502 may include a first pattern 1502 a towhich the first color is assigned, a second pattern 1502 b to which asecond color is assigned, and a third pattern 1502 c to which a thirdcolor is assigned. A space between the first pattern 1502 a and thefirst boundary BD1 may be a first boundary space B1, a space between thesecond pattern 1502 b and the first boundary BD1 may be a secondboundary space B2, and a space between the third pattern 1502 c and thefirst boundary BD1 may be a third boundary space B3. At least two of thefirst to third boundary spaces B1, B2, and B3 may be different from eachother.

According to an exemplary embodiment, the second boundary space B2 maybe determined to be less than the first boundary space B. For example,the first boundary space B1 may be 75, and the second boundary space B2may be 25. Further, the third boundary space B3 may be determined to beequal to or greater than the second boundary space B2 and equal to orless than the first boundary space B. For example, the third boundaryspace B3 may be 50.

According to the present exemplary embodiment, since a space between thefirst patterns 1501 a and 1502 a that are arranged on two sides of thefirst boundary BD1 and have the same color is 100, the spacetherebetween satisfies a first space condition. Further, since a spacebetween the first pattern 1501 b and the second pattern 1502 b that arearranged on two sides of the first boundary BD1 and have differentcolors is 50, the space therebetween satisfies a second space condition.

FIG. 16 illustrates an example of a cell designed using the method ofFIG. 14 according to an exemplary embodiment of the inventive concept.

Referring to FIG. 16, the cell 160 may be defined by a cell boundary CBincluding a first boundary BD1 and a second boundary BD2. The firstboundary BD1 may be referred to as a right boundary, and the secondboundary BD2 may be referred to as a left boundary. The cell 160 mayinclude a first right pattern 161 having a first color, a second rightpattern 162 having a second color, a third right pattern 163 having athird color, and a left pattern 164 having the first color. However,exemplary embodiments of the inventive concept are not limited thereto.For example, in an exemplary embodiment, the left pattern 164 may havethe second color or the third color.

The first to third right patterns 161, 162, and 163 may be generatedusing the method of FIG. 14. In an exemplary embodiment, a firstboundary space B1 between the first right pattern 161 and the firstboundary BD1 may be greater than a second boundary space B2 between thesecond right pattern 162 and the first boundary BD1. However, exemplaryembodiments of the inventive concept are not limited thereto. Forexample, in an exemplary embodiment, the first boundary space B1 betweenthe first right pattern 161 and the first boundary BD1 may be less thanthe second boundary space B2 between the second right pattern 162 andthe first boundary B1.

In an exemplary embodiment, a third boundary space B3 between the thirdright pattern 163 and the first boundary BD1 may be equal to or greaterthan the second boundary space B2 and equal to or less than the firstboundary space B1. In an exemplary embodiment, when the second boundaryspace B2 is greater than the first boundary space B1, the third boundaryspace B3 may be equal to or greater than the first boundary space B1 andequal to or less than the second boundary space B2.

The left pattern 164 may be generated using a method that issubstantially similar to the method of FIG. 8. For example, initially,one of first to third colors may be assigned to the left pattern 164adjacent to the second boundary BD2. Thereafter, a boundary space Bfbetween the left pattern 164 adjacent to the second boundary BD2 and thesecond boundary BD2 may be determined to be equal to or larger than thesmallest value of the first to third boundary spaces B1, B2, and B3.Thus, in an operation of placing cells, first and second spaceconditions may be satisfied between patterns included in a cell to beplaced adjacent to a left side of the cell 160 and the left pattern 164included in the cell 160.

FIG. 17 illustrates an example of applying a color inverting operationto an IC including the cell shown in FIG. 16 according to an exemplaryembodiment of the inventive concept.

Referring to FIG. 17, an IC 171 may include first to fourth standardcells 1701 to 1704 arranged along a first direction DR1. The firststandard cell 1701 may include first to third left patterns 1701 a to1701 c and a right pattern 1701 d. A boundary space B3 (e.g., 50) of thethird left pattern 1701 c may be greater than a boundary space B2 (e.g.,25) of the first left pattern 1701 a and less than a boundary space B1(e.g., 75) of the second left pattern 1701 b. A boundary space Bf of theright pattern 1701 d may be equal to or greater than the smallest valueof the left boundary spaces B1, B2, and B3. For example, the boundaryspace Bf may be 25.

The second standard cell 1702 may include first to third left patterns1702 a to 1702 c and a right pattern 1702 d. The boundary space B3(e.g., 50) of the third left pattern 1702 c may be greater than theboundary space B2 (e.g., 25) of the second left pattern 1702 b and lessthan the boundary space B1 (e.g., 75) of the first left pattern 1702 a.The boundary space Bf of the right pattern 1702 d may be the smallestvalue of the left boundary spaces B1, B2, and B3. For example, theboundary space Bf may be 25.

In this case, since the right pattern 1701 d and the first left pattern1702 a have the same color, a space between the right pattern 1701 d andthe first left pattern 1702 a should satisfy a first space condition. Inthe present example, since the space between the right pattern 1701 dand the first left pattern 1702 a is 100, the space therebetweensatisfies the first space condition. Further, since the right pattern1701 d and the second left pattern 1702 b have different colors, a spacebetween the right pattern 1701 d and the second left pattern 1702 bshould satisfy a second space condition. In the present example, since aspace between the right pattern 1701 d and the second left pattern 1702b is 50, the space therebetween satisfies the second space condition.

The third standard cell 1703 may include first to third right patterns1703 a to 1703 c and a left pattern 1703 d. The boundary space B3 (e.g.,50) of the third right pattern 1703 c may be greater than the boundaryspace B2 (e.g., 25) of the second right pattern 1703 b and less than theboundary space B1 (e.g., 75) of the first right pattern 1703 a. Theboundary space Bf of the left pattern 1703 d may be equal to or greaterthan the smallest value of the right boundary spaces B1, B2, and B3. Forexample, the boundary space Bf may be 25.

In this case, since the right pattern 1702 d and the left pattern 1703 dhave the same color, a space between the right pattern 1702 d and theleft pattern 1703 d should satisfy the first space condition. In thepresent example, since the space between the right pattern 1702 d andthe left pattern 1703 d is 50, the space therebetween does not satisfythe first space condition. Accordingly, a color conflict occurs betweenthe right pattern 1702 d and the left pattern 1703 d.

The fourth standard cell 1704 may include first to third left patterns1704 a to 1704 c and a right pattern 1704 d. A boundary space B3 (e.g.,50) of the third left pattern 1704 c may be greater than a boundaryspace B2 (e.g., 25) of the second left pattern 1704 b and less than aboundary space B1 (e.g., 75) of the first left pattern 1704 a. Aboundary space Bf of the right pattern 1704 d may be equal to or greaterthan the smallest value of the left boundary spaces B1, B2, and B3. Forexample, the boundary space Bf may be 25.

In this case, since the second right pattern 1703 b and the second leftpattern 1704 b have the same color, a space between the second rightpattern 1703 b and the second left pattern 1704 b should satisfy thefirst space condition. In the present example, since the space betweenthe second right pattern 1703 b and the second left pattern 1704 b is50, the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern1703 b and the second left pattern 1704 b.

Since the third right pattern 1703 c and the third left pattern 1704 chave the same color, a space between third right pattern 1703 c and thethird left pattern 1704 c should satisfy the first space condition. Inthe present example, since a space between the third right pattern 1703c and the third left pattern 1704 c is 100, the space therebetweensatisfies the first space condition. Similarly, since the space betweenthe first right pattern 1703 a and the first left pattern 1704 a is 150,the space therebetween satisfies the first space condition.

An IC 172 may perform a color inverting operation on the third standardcell 1703 to solve a color conflict between the second standard cell1702 and the third standard cell 1703, and a color conflict between thethird standard cell 1703 and the fourth standard cell 1704. In thepresent exemplary embodiment, a color inverting operation may beperformed between the first color and the second color, and a colorinverting operation may not be performed on the third color. Thus, aleft pattern 1703 d′ and a second right pattern 1703 b′ may be changedfrom the second color into the first color, and a first right pattern1703 a′ may be changed from the first color into the second color.

Thus, the right pattern 1702 d and the left pattern 1703 d′ may havedifferent colors, and a space between the right pattern 1702 d and theleft pattern 1703 d′ may satisfy the second space condition. As aresult, a color conflict may be solved. Further, the second rightpattern 1703 b′ and the second left pattern 1704 b may have differentcolors, and a space between the second right pattern 1703 b′ and thesecond left pattern 1704 b may satisfy the second space condition. As aresult, a color conflict may be solved.

FIG. 18 illustrates an example of a cell designed using the method ofFIG. 14 according to an exemplary embodiment of the inventive concept.

Referring to FIG. 18, the cell 180 may be defined by a cell boundary CBincluding a first boundary BD1 and a second boundary BD2. The firstboundary BD1 may be referred to as a right boundary, and the secondboundary BD2 may be referred to as a left boundary. The cell 180 mayinclude a first right pattern 181 having a first color, a second rightpattern 182 having a second color, a third right pattern 183 having athird color, and first and second left patterns 184 and 185 having thefirst color. However, exemplary embodiments of the inventive concept arenot limited thereto. For example, in an exemplary embodiment, the firstand second left patterns 184 and 185 may have the second color or thethird color.

The first to third right patterns 181, 182, and 183 may be generatedusing the method of FIG. 14. In an exemplary embodiment, a firstboundary space B1 between the first right pattern 181 and the firstboundary BD1 may be greater than a second boundary space B2 between thesecond right pattern 182 and the first boundary BD1. However, exemplaryembodiments of the inventive concept are not limited thereto. Forexample, in an exemplary embodiment, the first boundary space B1 betweenthe first right pattern 181 and the first boundary BD1 may be less thanthe second boundary space B2 between the second right pattern 182 andthe first boundary BD1.

In an exemplary embodiment, a third boundary space B3 between the thirdright pattern 183 and the first boundary BD1 may be equal to or greaterthan the second boundary space B2 and equal to or less than the firstboundary space B1. In an exemplary embodiment, when the second boundaryspace B2 is greater than the first boundary space B1, the third boundaryspace B3 may be equal to or greater than the first boundary space B1 andequal to or less than the second boundary space B2.

The first and second left patterns 184 and 185 may be generated using asubstantially similar method to the method described with reference toFIG. 11. For example, initially, one of the first to third colors may beassigned to the first and second left patterns 184 and 185 adjacent tothe second boundary BD2. Thereafter, boundary spaces Bf between thefirst and second left patterns 184 and 185 adjacent to the secondboundary BD2 and the second boundary BD2 may be determined to be equalto each other and equal to or greater than the smallest value of thefirst to third boundary spaces B1, B2, and B3. Thus, in an operation ofplacing cells, first and second space conditions may be satisfiedbetween patterns included in a cell to be placed adjacent to a left sideof the cell 180 and the first and second left patterns 184 and 185included in the cell 180.

FIG. 19 illustrates an example of applying a color inverting operationto an IC including the cell shown in FIG. 18 according to an exemplaryembodiment of the inventive concept.

Referring to FIG. 19, an IC 191 may include first to fourth standardcells 1901 to 1904 arranged along a first direction DR1. The firststandard cell 1901 may include first to third right patterns 1901 a to1901 c and first and second left patterns 1901 d and 1901 e. A boundaryspace B3 (e.g., 50) of the third right pattern 1901 c may be greaterthan a boundary space B2 (e.g., 25) of the second right pattern 1901 band less than a boundary space B1 (e.g., 75) of the first right pattern1901 a. A boundary space Bf of the first and second left patterns 1901 dand 1901 e may be equal to or greater than the smallest value of theright boundary spaces B1, B2, and B3. For example, the boundary space Bfmay be 25.

The second standard cell 1902 may include first to third right patterns1902 a to 1902 c and first and second left patterns 1902 d and 1902 e.The boundary space B3 (e.g., 50) of the third right pattern 1902 c maybe greater than the boundary space B2 (e.g., 25) of the second rightpattern 1902 b and less than the boundary space B1 (e.g., 75) of thefirst right pattern 1902 a. The boundary space Bf of the first andsecond left patterns 1902 d and 1902 e may be equal to or greater thanthe smallest value of the right boundary spaces B1, B2, and B3. Forexample, the boundary space Bf may be 25.

In this case, since the first right pattern 1901 a and the first leftpattern 1902 d have the same color, a space between the first rightpattern 1901 a and the first left pattern 1902 d should satisfy a firstspace condition. In the present example, since the space between thefirst right pattern 1901 a and the first left pattern 1902 d is 100, thespace therebetween satisfies the first space condition. Further, sincethe second right pattern 1901 b and the second left pattern 1902 c havedifferent colors, a space between the second right pattern 1901 b andthe second left pattern 1902 e should satisfy a second space condition.In the present example, since a space between the second right pattern1901 b and the second left pattern 1902 e is 50, the space therebetweensatisfies the second space condition.

The third standard cell 1903 may include first to third left patterns1903 a to 1903 c and first and second right patterns 1903 d and 1903 e.A boundary space B3 (e.g., 50) of the third left pattern 1903 c may begreater than the boundary space B2 (e.g., 25) of the second left pattern1903 b and less than the boundary space B1 (e.g., 75) of the first leftpattern 1903 a. A boundary space Bf of the first and second rightpatterns 1903 d and 1903 e may be equal to or greater than the smallestvalue of the left boundary spaces B1, B2, and B3. For example, theboundary space Bf may be 25.

In this case, since the second right pattern 1902 b and the second leftpattern 1903 b have the same color, a space between the second rightpattern 1902 b and the second left pattern 1903 b should satisfy a firstspace condition. In the present example, since the space between thesecond right pattern 1902 b and the second left pattern 1903 b is 50,the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern1902 b and the second left pattern 1903 b.

Since the third right pattern 1902 c and the third left pattern 1903 chave the same color, a space between the third right pattern 1902 c andthe third left pattern 1903 c should satisfy the first space condition.In the present example, since the space between the third right pattern1902 c and the third left pattern 1903 c is 100, the space therebetweensatisfies the first space condition. Similarly, since a space betweenthe first right pattern 1902 a and the first left pattern 1903 a is 150,the space therebetween satisfies the first space condition.

The fourth standard cell 1904 may include first to third right patterns1904 a to 1904 c and first and second left patterns 1904 d and 1904 e.The boundary space B3 (e.g., 50) of the third right pattern 1904 c maybe greater than the boundary space B2 (e.g., 25) of the second rightpattern 1904 b and less than the boundary space B1 (e.g., 75) of thefirst right pattern 1904 a. The boundary space Bf of the first andsecond left patterns 1904 d and 1904 e may be equal to or greater thanthe smallest value of the right boundary spaces B1, B2, and B3. Forexample, the boundary space Bf may be 25.

In this case, since the first right pattern 1903 d and the first leftpattern 1904 d have the same color, a space between the first rightpattern 1903 d and the first left pattern 1904 d should satisfy thefirst space condition. In the present example, since a space between thefirst right pattern 1903 d and the first left pattern 1904 d is 50, thespace therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the first right pattern1903 d and the first left pattern 1904 d.

Similarly, since the second right pattern 1903 e and the second leftpattern 1904 e have the same color, a space between the second rightpattern 1903 e and the second left pattern 1904 e should satisfy thefirst space condition. In the present example, since the space betweenthe second right pattern 1903 e and the second left pattern 1904 e is50, the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern1903 e and the second left pattern 1904 e.

An IC 192 may perform a color inverting operation on the third standardcell 1903 to solve a color conflict between the second standard cell1902 and the third standard cell 1903, and a color conflict between thethird standard cell 1903 and the fourth standard cell 1904. In thepresent example, a color inverting operation is performed between thefirst color and the second color, while a color inverting operation isnot performed on the third color. Thus, a first left pattern 1903 a′ andfirst and second right patterns 1903 d′ and 1903 e′ may be changed fromthe first color into the second color, and a second left pattern 1903 b′may be changed from the second color into the first color.

Thus, the second right pattern 1902 b and the second left pattern 1903b′ may have different colors, and a space between the second rightpattern 1902 b and the second left pattern 1903 b′ may satisfy thesecond space condition, thus solving a color conflict. Further, thefirst right pattern 1903 d′ and the first left pattern 1904 d may havedifferent colors, and a space between the first right pattern 1903 d′and the first left pattern 1904 d may satisfy the second spacecondition, thus solving a color conflict may. Further, the second rightpattern 1903 e′ and the second left pattern 1904 e may have differentcolors, and a space between the second right pattern 1903 e′ and thesecond left pattern 1904 e may satisfy the second space condition, thussolving a color conflict.

FIG. 20 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

Referring to FIG. 20, a method S200C of designing a cell according tothe present exemplary embodiment may correspond to an example ofoperation S200 of FIG. 2. Accordingly, for convenience of explanation, afurther description of process and elements previously described withreference to FIG. 2 may be omitted herein.

In operation S2000, first to fourth colors may be respectively assignedto first to fourth patterns. The first to fourth colors may be differentfrom one another and respectively correspond to first to fourth masks.The first to fourth patterns may be different patterns included in thesame layer. Hereinafter, a pattern to which a first color is assignedwill be referred to as a first pattern (e.g., PT1), a pattern to which asecond color is assigned will be referred to as a second pattern (e.g.,PT2), a pattern to which a third color is assigned will be referred toas a third pattern (e.g., PT3), and a pattern to which a fourth color isassigned will be referred to as a fourth pattern (e.g., PT4).

In an exemplary embodiment, since color decomposition is performed usingfour colors (e.g., the first to fourth colors), the first to fourthpatterns may be formed using four masks. Accordingly, the first tofourth patterns according to an exemplary embodiment may be formed byusing quadruple patterning technology (QPT).

In operation S2020, a first boundary space may be determined based on afirst space. The first space may be the smallest space between patternsto which the same color is assigned. The first boundary space may be aspace between the first pattern adjacent to a first boundary and thefirst boundary.

In operation S2040, a second boundary space may be determined to bedifferent from the first boundary space based on a second space. Thesecond space may be the smallest space between patterns to whichdifferent colors are assigned. The second boundary space may be a spacebetween the second pattern adjacent to the first boundary and the firstboundary. In the present exemplary embodiment, the second boundary spacemay be determined to be less than the first boundary space.

Referring to a general operation of designing cells, cells to be placedadjacent to each other cannot typically be predicted. According toexemplary embodiments of the inventive concept, when two cells areplaced adjacent to each other at the first boundary, the first andsecond boundary spaces may be determined such that patterns arranged ontwo sides of the first boundary satisfy the first and second spaceconditions.

In operation S2060, a third boundary space and a fourth boundary spacemay be determined to the same space based on the first space. In thepresent exemplary embodiment, the third and fourth boundary spaces maybe equal to or greater than the second boundary space and equal to orless than the first boundary space.

FIG. 21 illustrates an example of an IC including a cell designed usingthe method of FIG. 20 according to an exemplary embodiment of theinventive concept.

Referring to FIG. 21, an IC 210 may include first and second standardcells 2101 and 2102 placed adjacent to each other at a first boundaryBD1. The first standard cell 2101 may include first patterns 2101 a and2101 b to which a first color is assigned. A space Bf between the firstpattern 2101 a and the first boundary BD1 may be equal to the space Bfbetween the first pattern 2101 b and the first boundary BD1. Forexample, the space Bf may be 25.

The second standard cell 2102 may include a first pattern 2102 a towhich the first color is assigned, a second pattern 2102 b to which asecond color is assigned, a third pattern 2102 c to which a third coloris assigned, and a fourth pattern 2102 d to which a fourth color isassigned. A space between the first pattern 2102 a and the firstboundary BD1 may be a first boundary space B1, a space between thesecond pattern 2102 b and the first boundary BD1 may be a secondboundary space B2, a space between the third pattern 2102 c and thefirst boundary BD1 may be a third boundary space B3, and a space betweenthe fourth pattern 2102 d and the first boundary BD1 may be a fourthboundary space B4. At least two of the first, second, third, and fourthboundary spaces B1, B2, B3, and B4 may be different from one another.

According to the present exemplary embodiment, the second boundary spaceB2 may be determined to be less than the first boundary space B1. Forexample, the first boundary space B1 may be 75 and the second boundaryspace B2 may be 25. According to the present exemplary embodiment, thethird boundary space B3 may be determined to be equal to the fourthboundary space B4. Each of the third and fourth boundary spaces B3 andB4 may be determined to be equal to or greater than the second boundaryspace B2 and equal to or less than the first boundary space B1. Forexample, each of the third and fourth boundary spaces B3 and B4 may be50.

According to the present exemplary embodiment, since a space between thefirst patterns 2101 a and 2102 a, which are arranged on two sides of thefirst boundary BD1 and have the same color, is 100, the spacetherebetween satisfies a first space condition. Further, since a spacebetween the first pattern 2101 b and the second pattern 2102 b, whichare arranged on two sides of the first boundary BD1 and have differentcolors, is 50, the space therebetween satisfies a second spacecondition.

FIG. 22 illustrates an example of applying a color inverting operationto an IC including the cell designed using the method shown in FIG. 20according to an exemplary embodiment of the inventive concept.

Referring to FIG. 22, the IC 221 may include first to fourth standardcells 2201 to 2204 arranged along a first direction DR1. The firststandard cell 2201 may include first to fourth left patterns 2201 a to2201 d and a right pattern 2201 e. Each of boundary spaces B3 and B4(e.g., 50) of the third and fourth left patterns 2201 c and 2201 d maybe greater than a boundary space B2 (e.g., 25) of the first left pattern2201 a and less than a boundary space B1 (e.g., 75) of the second leftpattern 2201 b. A boundary space Bf of the right pattern 2201 e may beequal to or greater than a smallest value of left boundary spaces B, B2,B3, and B4. For example, the boundary space Bf may be 25.

The second standard cell 2202 may include first to fourth left patterns2202 a to 2202 d and a right pattern 2202 e. Each of the boundary spacesB3 and B4 (e.g., 50) of the third and fourth left patterns 2202 c and2202 d may be greater than the boundary space B2 (e.g., 25) of thesecond left pattern 2202 b and less than the boundary space B1 (e.g.,75) of the first left pattern 2202 a. The boundary space Bf of the rightpattern 2202 e may be equal to or greater than the smallest value of theleft boundary spaces B1, B2, B3, and B4. For example, the boundary spaceBf may be 25.

In this case, since the right pattern 2201 e and the second left pattern2202 b have different colors, a space between the right pattern 2201 eand the second left pattern 2202 b should satisfy a second spacecondition. In the present example, since a space between the rightpattern 2201 e and the second left pattern 2202 b is 50, the spacetherebetween satisfies the second space condition. Further, since theright pattern 2201 e and the first left pattern 2202 a have the samecolor, a space between the right pattern 2201 e and the first leftpattern 2202 a should satisfy a first space condition. In the presentexample, since a space between the right pattern 2201 e and the firstleft pattern 2202 a is 100, the space therebetween satisfies the firstspace condition.

The third standard cell 2203 may include first to fourth right patterns2203 a to 2203 d and a left pattern 2203 e. Each of the boundary spacesB3 and B4 (e.g., 50) of the third and fourth right patterns 2203 c and2203 d may be greater than the boundary space B2 (e.g., 25) of thesecond right pattern 2203 b and less than the boundary space B1 (e.g.,75) of the first right pattern 2203 a. The boundary space Bf of the leftpattern 2203 e may be equal to or greater than the smallest value of theright boundary spaces B1, B2, B3, and B4. For example, the boundaryspace Bf may be 25.

In this case, since the right pattern 2202 e and the left pattern 2203 ehave the same color, a space between the right pattern 2202 e and theleft pattern 2203 e should satisfy the first space condition. In thepresent example, since a space between the right pattern 2202 e and theleft pattern 2203 e is 50, the space therebetween does not satisfy thefirst space condition. Accordingly, a color conflict occurs between theright pattern 2202 e and the left pattern 2203 e.

The fourth standard cell 2204 may include first to fourth left patterns2204 a to 2204 d and a right pattern 2204 e. Each of the boundary spacesB3 and B4 (e.g., 50) of the third and fourth left patterns 2204 c and2204 d may be greater than the boundary space B2 (e.g., 25) of thesecond left pattern 2204 b and less than the boundary space B1 (e.g.,75) of the first left pattern 2204 a. The boundary space Bf of the rightpattern 2204 e may be equal to or greater than the smallest value of theleft boundary spaces B11, B2, B3, and B4. For example, the boundaryspace Bf may be 25.

In this case, since the second right pattern 2203 b and the second leftpattern 2204 b have the same color, a space between the second rightpattern 2203 b and the second left pattern 2204 b should satisfy thefirst space condition. In the present example, since the space betweenthe second right pattern 2203 b and the second left pattern 2204 b is50, the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern2203 b and the second left pattern 2204 b.

Since the third right pattern 2203 c and the third left pattern 2204 chave the same color, a space between the third right pattern 2203 c andthe third left pattern 2204 c should satisfy the first space condition.In the present example, since a space between the third right pattern2203 c and the third left pattern 2204 c is 100, the space therebetweensatisfies the first space condition. Similarly, since a space betweenthe first right pattern 2203 a and the first left pattern 2204 a is 150,the space therebetween satisfies the first space condition.

An IC 222 may perform a color inverting operation on the third standardcell 2203 to solve a color conflict between the second standard cell2202 and the third standard cell 2203, and a color conflict between thethird standard cell 2203 and the fourth standard cell 2204. In thepresent exemplary embodiment, a color inverting operation may beperformed between a first color and a second color, while a colorinverting operation may not be performed on a third color and a fourthcolor. Thus, a left pattern 2203 e′ and a second right pattern 2203 b′may be changed from the second color into the first color, and a firstright pattern 2203 a′ may be changed from the first color into thesecond color.

Thus, the right pattern 2202 e and the left pattern 2203 e′ may havedifferent colors, and a space between the right pattern 2202 e and theleft pattern 2203 e′ may satisfy the second space condition, thussolving a color conflict. Further, a second right pattern 2203 b′ andthe second left pattern 2204 b may have different colors, and a spacebetween the second right pattern 2203 b′ and the second left pattern2204 b may satisfy the second space condition, thus solving a colorconflict.

FIG. 23 is a flowchart of a method of designing a cell according to anexemplary embodiment of the inventive concept.

Referring to FIG. 23, the method S200D of designing a cell according toan exemplary embodiment may correspond to an example of operation S200of FIG. 2. Accordingly, for convenience of explanation, a furtherdescription of processes and elements described with reference to FIG. 2may be omitted herein.

In operation S2300, first to fourth colors may be respectively assignedto first to fourth patterns. The first to fourth colors may be differentfrom one another and respectively correspond to first to fourth masks.The first to fourth patterns may be different patterns included in thesame layer. Hereinafter, a pattern to which a first color is assignedwill be referred to as a first pattern (e.g., PT1), a pattern to which asecond color is assigned will be referred to as a second pattern (e.g.,PT2), a pattern to which a third color is assigned will be referred toas a third pattern (e.g., PT3), and a pattern to which a fourth color isassigned will be referred to as a fourth pattern (e.g., PT4).

In an exemplary embodiment, since color decomposition is performed usingfour colors (e.g., first to fourth colors), the first to fourth patternsmay be formed using four masks. Accordingly, the first to fourthpatterns according to an exemplary embodiment may be formed using QPT.

In operation S2320, a first boundary space may be determined based on afirst space. The first space may be the smallest space between patternsto which the same color is assigned. A first boundary space may be aspace between the first pattern adjacent to a first boundary and thefirst boundary.

In operation S2340, a second boundary space may be determined to bedifferent from the first boundary space based on a second space. Thesecond space may be the smallest space between patterns to whichdifferent colors are assigned. The second boundary space may be a spacebetween the second pattern adjacent to the first boundary and the firstboundary. In an exemplary embodiment, the second boundary space may bedetermined to be less than the first boundary space.

Referring to a general operation of designing a cell, cells to be placedadjacent to each other cannot typically be predicted. According toexemplary embodiments of the inventive concept, when two cells areplaced adjacent to each other at the first boundary, the first andsecond boundary spaces may be determined such that patterns arranged ontwo sides of the first boundary satisfy the first and second spaceconditions.

In operation S2360, a third boundary space may be determined based onthe first space. In an exemplary embodiment, the third boundary spacemay be equal to or greater than the second boundary space and equal toor less than the first boundary space. In operation S2380, a fourthboundary space may be determined to be different from the third boundaryspace based on the second space.

FIG. 24 illustrates an example of an IC including a cell designed usingthe method of FIG. 23 according to an exemplary embodiment of theinventive concept.

Referring to FIG. 24, an IC 240 may include first and second standardcells 2401 and 2402 placed adjacent to each other at a first boundaryBD1. The first standard cell 2401 may include first patterns 2401 a and2401 b to which a first color is assigned, and a space Bf between thefirst pattern 2401 a and a first boundary BD1 may be equal to the spaceBf between the first pattern 2401 b and the first boundary BD1. Forexample, the space Bf may be 25. The second standard cell 2402 mayinclude a first pattern 2402 a to which the first color is assigned, asecond pattern 2402 b to which a second color is assigned, a thirdpattern 2402 c to which a third color is assigned, and a fourth pattern2402 d to which a fourth color is assigned. A space between the firstpattern 2402 a and the first boundary BD1 may be a first boundary spaceB1, a space between the second pattern 2402 b and the first boundary BD1may be a second boundary space B2, a space between the third pattern2402 c and the first boundary BD1 may be a third boundary space B3, anda space between the fourth pattern 2402 d and the first boundary BD1 maybe a fourth boundary space B4. At least two of the first to fourthboundary spaces B1, B2, B3, and B4 may be different from one another.

According to the present example, the second boundary space B2 may bedetermined to be less than the first boundary space B1. For example, thefirst boundary space B1 may be 75, and the second boundary space B2 maybe 25. According to the present example, the third boundary space B3 maybe determined to be different from the fourth boundary space B4. Each ofthe third and fourth boundary spaces B3 and B4 may be determined to beequal to or greater than the second boundary space B2 and equal to orless than the first boundary space B1. According to the present example,the fourth boundary space B4 may be determined to be greater than thethird boundary space B3. For example, the third boundary space B3 may be25, and the fourth boundary space B4 may be 75.

According to the present example, since a space between the firstpatterns 2401 a and 2402 a, which are arranged on two sides of the firstboundary BD1 and have the same color, is 100, the space therebetweensatisfies a first space condition. Further, since a space between thefirst pattern 2401 b and the second pattern 2402 b, which are arrangedon two sides of the first boundary BD1 and have different colors, is 50,the space therebetween satisfies a second space condition.

FIG. 25 illustrates an example of applying a color inverting operationto an IC including the cell designed using the method shown in FIG. 23according to an exemplary embodiment of the inventive concept.

Referring to FIG. 25, an IC 251 may include first to fourth standardcells 2501 to 2504 arranged along a first direction DR1. The firststandard cell 2501 may include first to fourth left patterns 2501 a to2501 d and a right pattern 2501 e. Boundary spaces B2 and B3 of thefirst and third left patterns 2501 a and 2501 c may be the same (e.g.,25). Boundary spaces B1 and B4 of the second and fourth left patterns2501 b and 2501 d may be the same (e.g., 75) and greater than theboundary spaces B2 and B3 of the first and third left patterns 2501 aand 2501 c. A boundary space Bf of the right pattern 2501 e may be equalto or greater than the smallest value of the left boundary spaces B1 toB4. For example, the boundary space Bf may be 25.

The second standard cell 2502 may include first to fourth left patterns2502 a to 2502 d and a right pattern 2502 e. The boundary spaces B2 andB3 of the second and fourth left patterns 2502 b and 2502 d may be thesame (e.g., 25). The boundary spaces B1 and B4 of the first and thirdleft patterns 2502 a and 2502 c may be the same (e.g., 75) and may begreater than the boundary spaces B2 and B3 of the second and fourth leftpatterns 2502 b and 2502 d. The boundary space Bf of the right pattern2502 e may be equal to or greater than the smallest value of the leftboundary spaces B1 to B4. For example, the boundary space Bf may be 25.

In this case, since the right pattern 2501 e and the second left pattern2502 b have different colors, a space between the right pattern 2501 eand the second left pattern 2502 b should satisfy a second spacecondition. In the present example, since the space between the rightpattern 2501 e and the second left pattern 2502 b is 50, the spacetherebetween satisfies the second space condition. Further, since theright pattern 2501 e and the first left pattern 2502 a have the samecolor, a space between the right pattern 2501 e and the first leftpattern 2502 a should satisfy a first space condition. In the presentexample, since the space between the right pattern 2501 e and the firstleft pattern 2502 a is 100, the space therebetween satisfies the firstspace condition.

The third standard cell 2503 may include first to fourth right patterns2503 a to 2503 d and a left pattern 2503 e. The boundary spaces B2 andB3 of the second and third right patterns 2503 b and 2503 c may be thesame space (e.g., 25). The boundary spaces B1 and B4 of the first andfourth right patterns 2503 a and 2503 d may be the same (e.g., 75) andmay be greater than the boundary spaces B2 and B3 of the second andthird right patterns 2503 b and 2503 c. The boundary space Bf of theleft pattern 2503 e may be equal to or greater than the smallest valueof the right boundary spaces B1 to B4. For example, the boundary spaceBf may be 25.

In this case, since the right pattern 2502 e and the left pattern 2503 ehave the same color, a space between the right pattern 2502 e and theleft pattern 2503 e should satisfy the first space condition. In thepresent example, since a space between the right pattern 2502 e and theleft pattern 2503 e is 50, the space therebetween does not satisfy thefirst space condition. Accordingly, a color conflict occurs between theright pattern 2502 e and the left pattern 2503 e.

The fourth standard cell 2504 may include first to fourth left patterns2504 a to 2504 d and a right pattern 2504 e. The boundary spaces B2 andB3 of the second and third left patterns 2504 b and 2504 c may be thesame (e.g., 25). The boundary spaces B1 and B4 of the first and fourthleft patterns 2504 a and 2504 d may be the same (e.g., 75) and may begreater than the boundary spaces B2 and B3 of the second and third leftpatterns 2504 b and 2504 c. The boundary space Bf of the right pattern2504 e may be equal to or greater than the smallest value of the leftboundary spaces B1 to B4. For example, the boundary space Bf may be 25.

In this case, since the second right pattern 2503 b and the second leftpattern 2504 b have the same color, a space between the second rightpattern 2503 b and the second left pattern 2504 b should satisfy thefirst space condition. In the present example, since the space betweenthe second right pattern 2503 b and the second left pattern 2504 b is50, the space therebetween does not satisfy the first space condition.Accordingly, a color conflict occurs between the second right pattern2503 b and the second left pattern 2504 b.

In addition, since the fourth right pattern 2503 d and the fourth leftpattern 2504 d have the same color, a space between the fourth rightpattern 2503 d and the fourth left pattern 2504 d should satisfy thefirst space condition. In the present example, since the space betweenthe fourth right pattern 2503 d and the fourth left pattern 2504 d is150, the space therebetween satisfies the first space condition.

Since the third right pattern 2503 c and the third left pattern 2504 chave the same color, a space between the third right pattern 2503 c andthe third left pattern 2504 c should satisfy the first space condition.In the present example, since a space between the third right pattern2503 c and the third left pattern 2504 c is 50, the space therebetweendoes not satisfy the first space condition. Further, since the spacebetween the first right pattern 2503 a and the first left pattern 2504 ais 150, the space therebetween satisfies the first space condition.

An IC 252 may perform a color inverting operation on the third standardcell 2503 to solve a color conflict between the second standard cell2502 and the third standard cell 2503, and a color conflict between thethird standard cell 2503 and the fourth standard cell 2504. In thepresent example, a color inverting operation may be performed between afirst color and a second color, while a color inverting operation may beperformed between a third color and a fourth color.

Thus, a left pattern 2503 e′ and a second right pattern 2503 b′ may bechanged from the second color into the first color, and a first rightpattern 2503 a′ may be changed from the first color into the secondcolor. Further, a third right pattern 2503 c′ may be changed from thethird color into the fourth color, and a fourth right pattern 2503 d′may be changed from the fourth color into the third color.

Thus, the right pattern 2502 e and the left pattern 2503 e′ may havedifferent colors, and a space between the right pattern 2502 e and theleft pattern 2503 e′ may satisfy a second space condition, thus solvinga color conflict. Further, the second right pattern 2503 b′ and thesecond left pattern 2504 b may have different colors, and a spacebetween the second right pattern 2503 b′ and the second left pattern2504 b may satisfy the second space condition, thus solving a colorconflict. Further, the fourth right pattern 2503 d′ and the fourth leftpattern 2504 d may have different colors, and a space between the fourthright pattern 2503 d′ and the fourth left pattern 2504 d may satisfy thesecond space condition, thus solving a color conflict.

FIG. 26 illustrates an example of a layout of an IC including a celldesigned according to an exemplary embodiment of the inventive concept.

Referring to FIG. 26, an IC 260 may include first and second standardcells 261 and 262 disposed adjacent to each other at a first boundaryBD1. The first standard cell 261 may include a first pattern 2611 towhich a first color is assigned, and the second standard cell 262 mayinclude a first pattern 2612 a to which the first color is assigned anda second pattern 2612 b to which a second color is assigned. In thiscase, the first and second patterns 2611, 2612 a, and 2612 b may bepatterns constituting the same layer. In the present exemplaryembodiment, a space between the first patterns 2611 and 2612 a to whichthe first color is assigned, may be equal to or greater than a firstspace S1.

In addition, the second standard cell 262 may further include contacts2622 electrically connected to an active region. In an example, thefirst and second patterns 2611, 2612 a, and 2612 b may be formed in adifferent layer from the contacts 2622. For example, the first andsecond patterns 2611, 2612 a, and 2612 b may be formed over the contacts2622. The second standard cell 262 may further include first and secondpower supply lines VDD and VSS, and an extension direction of the firstand second power supply lines VDD and VSS may be substantiallyperpendicular to the first boundary BD1.

FIG. 27 is a flowchart of a method of designing an IC according to anexemplary embodiment of the inventive concept.

Referring to FIG. 27, the method of designing the layout of the ICaccording to an exemplary embodiment may correspond to an example ofoperation S10 of FIG. 1. Accordingly, for convenience of explanation, afurther description of processes and elements previously described withreference to FIG. 1 may be omitted herein.

In operation S2700, in a first zone adjacent to a first boundary, afirst cell including first colorless patterns that satisfy a first spacecondition may be designed. The first zone may be a virtual spacegenerated in an operation of designing a cell. According to an exemplaryembodiment, patterns having different colors may be forced not to beformed in the first zone.

In operation S2720, first and second cells may be placed adjacent toeach other at the first boundary. For example, the first cell may beinitially placed, and the second cell may be placed adjacent to thefirst boundary of the first cell along a direction in which the firstand second cells are placed. Operation S2720 may be an example ofoperation S13 of FIG. 1. The second cell may be arbitrary cell stored ina standard cell library.

In an exemplary embodiment, the second cell may be a cell designed dueto operation S2700. For example, colorless patterns that satisfy a firstspace condition may be arranged in a zone adjacent to one boundary ofthe second cell. In an exemplary embodiment, the second cell may be acell that is not designed due to operation S2700. For example, colorlesspatterns that do not satisfy the first space condition may be arrangedin the zone adjacent to the one boundary of the second cell.

In an exemplary embodiment, the first and second cells may be placeddirectly adjacent to the first boundary. In this case, the firstboundary may substantially overlap one boundary of the second cell. Inan exemplary embodiment, the second cell may be adjacent to the firstboundary and placed a predetermined space apart from the first boundary.

In operation S2740, the same color may be assigned to first colorlesspatterns. According to an exemplary embodiment, after the operation ofplacing the cells, the same color may be assigned to the first colorlesspatterns generated in the first zone in the operation of designing thecells. Since the same color may be assigned to the first colorlesspatterns later, a space between two arbitrary first colorless patternsin the first zone may be equal to or greater than the first space. In anexemplary embodiment, in the operation of designing the first cell, thefirst cell may be designed not to include patterns that have differentcolors and are arranged at the same level as the first colorlesspatterns in the first zone.

FIG. 28 illustrates a method of assigning colors to colorless patternsaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 28, an IC 280A may include first and second standardcells 281 and 282 placed adjacent to a first boundary BD1. In the IC280A, the first standard cell 281 may include colorless patterns 281 ato 281 c to which no color is assigned, and the second standard cell 282may include colorless patterns 282 a and 282 c to which no color isassigned. Herein, CL_PT may be used in the figures to indicate colorlesspatterns.

In an exemplary embodiment, the colorless patterns 281 a to 281 c, 282a, and 282 c may correspond to via plugs. For example, the colorlesspatterns 281 a to 281 c, 282 a, and 282 c may be via plugs configured toconnect contacts with a first metal layer. In an example, the colorlesspatterns 281 a to 281 c, 282 a, and 282 c may be via plugs configured toconnect the first metal layer with a second metal layer.

In an operation performed after the first and second standard cells 281and 282 are placed, a coloring operation for assigning colors to thecolorless patterns 281 a to 281 c, 282 a, and 282 c may be performed.For example, the coloring operation may be performed in a design rulecheck (DRC) operation. An IC 280B may include first and second standardcells 281′, 282′, which may be generated by the coloring operation forassigning the colors to the colorless patterns 281 a to 281 c, 282 a,and 282 c.

For example, a first color may be assigned to the colorless patterns 281a and 282 a due to the coloring operation so that the colorless patterns281 a and 282 a may be referred to as first patterns 281 a′ and 282 a′.Further, a second color may be assigned to the colorless pattern 281 bdue to the coloring operation so that the colorless pattern 281 b may bereferred to as a second pattern 281 b′. Further, a third color may beassigned to the colorless patterns 281 c and 282 c due to the coloringoperation so that the colorless patterns 281 c and 282 c may be referredto as third patterns 281 c′ and 282 c′.

FIG. 29 illustrates an example of assigning three colors to fourcolorless patterns according to an exemplary embodiment of the inventiveconcept.

Referring to FIG. 29, IC 290 may include first and second standard cells291 and 292 placed adjacent to each other at a first boundary BD1. Afirst power line VDD may be arranged parallel to an upper boundary BD_Uthat is substantially perpendicular to the first boundary BD1, and asecond power line VSS may be arranged substantially parallel to a lowerboundary BD_L that is substantially perpendicular to the first boundaryBD1.

The first standard cell 291 may include patterns 291 a and 291 barranged adjacent to the first boundary BD1. In the first standard cell291 stored in a standard cell library, before or directly after anoperation of placing cells, the patterns 291 a and 291 b may becolorless patterns. The second standard cell 292 may include patterns292 a and 292 b arranged adjacent to the first boundary BD1. Before ordirectly after the operation of placing cells, in the second standardcell 292 stored in the standard cell library, the patterns 292 a and 292b may be colorless patterns.

To form four patterns 291 a, 291 b, 292 a, and 292 b adjacent to thefirst boundary BD1, when three masks are used, three colors must beassigned to four patterns 291 a, 291 b, 292 a, and 292 b. Thus, the samecolor may be assigned to two of the four patterns 291 a, 291 b, 292 a,and 292 b. In this case, since two arbitrary patterns to which the samecolor is assigned must satisfy a first space condition, a colorconflict, which does not occur on a cell level, may occur on a chiplevel.

For example, if a first color is assigned to the pattern 291 a, a secondcolor is assigned to the pattern 292 a, and a third color is assigned tothe pattern 291 b, one of the first to third colors must be assigned tothe pattern 292 b. In this case, the pattern 292 b and a pattern towhich the same color as a color assigned to the pattern 292 b isassigned must satisfy the first space condition. Thus, to ensure apredetermined space between the first standard cell 291 and the secondstandard cell 292, the second standard cell 292 may be placed apredetermined space apart from the first standard cell 291. Thus, sincean area of the IC 290 increases, spatial efficiency may be reduced.

FIG. 30 illustrates an example of an IC including a cell designed usingthe method of FIG. 27 according to an exemplary embodiment of theinventive concept.

Referring to FIG. 30, an IC 300 may include first and second standardcells 301 and 302 placed adjacent to each other at a first boundary BD1.A first power line VDD may be arranged substantially parallel to anupper boundary BD_U that is substantially perpendicular to the firstboundary BD1. A second power line VSS may be arranged substantiallyparallel to a lower boundary BD_L that is substantially perpendicular tothe first boundary BD1.

According to an exemplary embodiment, the first standard cell 301 mayhave a first zone FZ adjacent to the first boundary BD1, and first andsecond patterns 301 a and 301 b may be arranged in the first zone FZ. Inthis case, a space between the first pattern 301 a and the secondpattern 301 b may be equal to or greater than a first space S1.Accordingly, after a coloring operation is performed, even if the samecolor is assigned to the first and second patterns 301 a and 301 b, acolor conflict does not occur between the first and second patterns 301a and 301 b.

The second standard cell 302 may include first and second patterns 302 aand 302 b arranged adjacent to the first boundary BD1, and a spacebetween the first pattern 302 a and the second pattern 302 b may bedetermined to be equal to or greater than a second space. Thus, even ifthree colors are assigned to the four patterns 301 a, 301 b, 302 a, and302 b, a color conflict does not occur among the four patterns 301 a,301 b, 302 a, and 302 b.

FIG. 31 is a flowchart of a method of designing an IC according to anexemplary embodiment of the inventive concept.

Referring to FIG. 31, a method of designing the layout of the ICaccording to the present exemplary embodiment may correspond to anexample of operation S10 of FIG. 1. Accordingly, for convenience ofexplanation, a further description of processes and elements previouslydescribed with reference to FIG. 1 may be omitted herein. Further, themethod of designing the layout of the IC according to the presentexemplary embodiment may correspond to a modified example of theexemplary embodiment of FIG. 27. Accordingly, for convenience ofexplanation, a further description of processes and elements previouslydescribed with reference to FIG. 27 may be omitted herein.

In operation S3100, a first cell including first colorless patterns andsecond colorless patterns may be designed. The first colorless patternsmay be arranged in a first zone adjacent to a first boundary and maysatisfy a first space condition. The second colorless patterns may bearranged in a second zone adjacent to the second boundary and maysatisfy the first space condition. The first and second zones may bevirtual spaces generated in an operation of generating cells. Accordingto an exemplary embodiment, generation of patterns having differentcolors in the first zone may be prohibited. Similarly, generation ofpatterns having different colors in the second zone may be prohibited.

In operation S3120, the first cell and a second cell may be placedadjacent to each other at the first boundary. For example, the firstcell may be initially placed, and the second cell may be placed adjacentto the first boundary of the first cell along a direction in which thefirst and second cells are placed. Operation S3120 may be an example ofoperation S13 of FIG. 1. The second cell may be an arbitrary cell storedin a standard cell library.

In operation S3140, a first color and a second color may be respectivelyassigned to the first colorless patterns and the second colorlesspatterns. In an exemplary embodiment, the first color may be the same asthe second color. In an exemplary embodiment, the first color may bedifferent from the second color.

Thus, according to an exemplary embodiment, after the operation ofplacing the cells, the same color may be assigned to the first colorlesspatterns generated in the first zone in the operation of designing thecells. Since the same color may be assigned to the first colorlesspatterns later, a space between two arbitrary first colorless patternsin the first zone may be equal to or greater than a first space.

Further, after the operation of placing the cells, the same color may beassigned to the second colorless patterns generated in the second zonein the operation of designing the cells. Since the same color may beassigned to the second colorless patterns later, a space between twoarbitrary colorless patterns in the second zone may be equal to orgreater than the first space.

FIG. 32 illustrates an example of an IC including a cell designed usingthe method of FIG. 31 according to an exemplary embodiment of theinventive concept.

Referring to FIG. 32, an IC 320 may include first to third standardcells 321, 322, and 323 arranged in a first direction. A first powerline VDD may be arranged substantially parallel to an upper boundaryBD_U that is substantially perpendicular to first and second boundariesBD1 and BD2. A second power line VSS may be arranged substantiallyparallel to a lower boundary BD_L that is substantially perpendicular tothe first and second boundaries BD1 and BD2.

The first standard cell 321 may have a first zone FZ1 adjacent to thefirst boundary BD1. The first zone FZ1 may be a virtual space that mayprohibit generation of patterns to which different colors are assigned.Only patterns to which the same color is assigned or colorless patternsto which the same color is to be assigned may be generated in the firstzone FZ1. In an exemplary embodiment, the first standard cell 321 mayinclude a colorless pattern 321 a disposed in the first zone FZ1.

The second standard cell 322 may have a second zone FZ2 adjacent to thefirst boundary BD1. The second zone FZ2 may be a virtual space that mayprohibit generation of patterns to which different colors are assigned.Only patterns to which the same color is assigned or colorless patternsto which the same color is to be assigned may be generated in the secondzone FZ2. In an exemplary embodiment, the second standard cell 322 mayinclude a colorless pattern 322 a disposed in the second zone FZ2.

In an exemplary embodiment, the second standard cell 322 may furtherinclude a first pattern 322 b disposed in the second zone FZ2. In thiscase, a space s1 between the colorless pattern 322 a and the firstpattern 322 b may be equal to or greater than the first space S1. Thecolorless pattern 322 a and the first pattern 322 b may have the samecolor.

In an exemplary embodiment, the second standard cell 322 may furtherinclude a second pattern 322 c arranged outside of the second zone FZ2.In this case, a space s2 between the colorless pattern 322 a and thesecond pattern 322 c may be less than the first space S1. Accordingly,the second pattern 322 c may have a different color from the colorlesspattern 322 a. Thus, only patterns having the same color may be arrangedin the second zone FZ2.

Even if a third pattern 322 d has a different color from the colorlesspattern 322 a, the third pattern 322 d cannot be arranged at a boundaryof the second zone FZ2 or in the second zone FZ2. Since a space betweenthe colorless pattern 322 a arranged in the first zone FZ1 of the firststandard cell 321 and the third pattern 322 d is equal to or less thanthe first space S1, when the same color is assigned to the colorlesspattern 322 a and the third pattern 322 d, a color conflict may occurbetween the colorless pattern 322 a and the third pattern 322 d.

The second standard cell 322 may further include a third zone FZ3disposed adjacent to the second boundary BD2. The third zone FZ3 may bea virtual space that may prohibit generation of patterns to whichdifferent colors are assigned. Only patterns to which the same color isassigned or colorless patterns to which the same color is to be assignedmay be generated in the third zone FZ3. In an exemplary embodiment, thesecond standard cell 322 may include colorless patterns 322 e and 322 fdisposed in the third zone FZ3. In this case, a space between thecolorless patterns 322 e and 322 f may be equal to or greater than thefirst space S1.

The third standard cell 323 may have a fourth zone FZ4 disposed adjacentto the second boundary BD2. The fourth zone FZ4 may be a virtual spacethat may prohibit generation of patterns to which different colors areassigned. Only patterns to which the same color is assigned or colorlesspatterns to which the same color is to be assigned may be generated inthe fourth zone FZ4. In an exemplary embodiment, the third standard cell323 may include colorless patterns 323 a and 323 b disposed in thefourth zone FZ4. In this case, a space between the colorless patterns323 a and 323 b may be equal to or greater than the first space S1. Inan exemplary embodiment, different colors may be assigned to thecolorless patterns 322 e and 322 f disposed in the third zone FZ3 andthe colorless patterns 323 a and 323 b disposed in the fourth zone FZ4.

In an exemplary embodiment, the first zone FZ1 may be generated to be apredetermined space apart from the first boundary BD1. In an exemplaryembodiment, the first zone FZ1 may be generated to be in contact withthe first boundary BD1. In an exemplary embodiment, the second zone FZ2may be generated to be a predetermined space apart from the firstboundary BD1. In an exemplary embodiment, the second zone FZ2 may begenerated to be in contact with the first boundary BD1. In an exemplaryembodiment, the third zone FZ3 may be generated to be a predeterminedspace apart from the second boundary BD2. In an exemplary embodiment,the third zone FZ3 may be generated to be in contact with the secondboundary BD2. In an exemplary embodiment, the fourth zone FZ4 may begenerated to be a predetermined space apart from the second boundaryBD2. In an exemplary embodiment, the fourth zone FZ4 may be generated tobe in contact with the second boundary BD2.

FIG. 33 illustrates an example of a layout of an IC including a celldesigned according to an exemplary embodiment of the inventive concept.

Referring to FIG. 33, an IC 331 may include first and second standardcells 3311 and 3312 adjacent to a first boundary BD1. The first standardcell 3311 may include a pattern 3311 a adjacent to the first boundaryBD1, and a first via V1 may be formed on the pattern 3311 a. The secondstandard cell 3312 may include first and second patterns 3312 a and 3312b, and the first pattern 3312 a may be located in a first zone FZ. Inthis case, second and third vias V2 and V3 may be located on the firstpattern 3312 a, and a fourth via V4 may be located on the second pattern3312 b.

To form the first to third vias V1 to V3, when two masks are used, thefirst to third vias V1 to V3 are decomposed into two colors. Since thefirst zone FZ is a space that does not allow patterns having differentcolors, the same color may be assigned to the second and third vias V2and V3. In this case, when a space between the second via V2 and thethird via V3 is less than a first space S1, a color conflict may occurbetween the second via V2 and the third via V3.

In an IC 332, to solve a color conflict between the second via V2 andthe third via V3, a space between a second via V2′ and a third via V3′may be determined to be equal to or greater than first space S1, so thatthe second via V2′ and the third via V3′ may satisfy the first spacecondition.

FIG. 34 illustrates an example of a standard cell including a celldesigned according to an exemplary embodiment of the inventive concept.

Referring to FIG. 34, the standard cell SC may be defined by a cellboundary CB and may include a plurality of fins FN, a plurality ofactive regions (e.g., first and second active regions AR1 and AR2), aplurality of conductive lines CL, and a plurality of contacts CA. Thecell boundary CB may be an outline defining the standard cell SC, and aP&R tool may recognize the standard cell SC using the cell boundary CB.The cell boundary CB may include four boundary lines.

The plurality of fins FN may extend in a first direction (e.g., Xdirection) and be arranged substantially parallel to one another in asecond direction (e.g., Y direction) substantially perpendicular to thefirst direction. The first active region AR1 and the second activeregion AR2 may be arranged substantially parallel to one another and mayhave different conductivity types. In an exemplary embodiment, threefins FN may be arranged in each of the first and second active regionsAR1 and AR2. However, exemplary embodiments of the inventive concept arenot limited thereto. For example, in an exemplary embodiment, the numberof fins FN arranged in each of the first and second active regions AR1and AR2 may be variously changed.

In this case, the plurality of fins FN arranged in the first and secondactive regions AR1 and AR2 may be referred to as active fins. AlthoughFIG. 34 illustrates only active fins, exemplary embodiments of theinventive concept are not limited thereto. The standard cell SC mayfurther include, for example, the cell boundary CB, the first activeregion AR1, a region between the first and second active regions AR1 andAR2, and/or dummy fins arranged in a region between the second activeregion AR2 and the cell boundary CB.

The plurality of conductive lines CL may extend in the second direction(e.g., Y direction) and may be arranged substantially parallel to oneanother in the first direction (e.g., X direction). In this case, theconductive lines CL may be formed of a material having electricalconductivity. For example, the conductive lines CL may includepolysilicon (poly-Si), a metal, or a metal alloy.

In an exemplary embodiment, the conductive lines CL may correspond togate electrodes. However, exemplary embodiments of the inventive conceptare not limited thereto. In an exemplary embodiment, the conductivelines CL may have traces having an arbitrary conductivity. Further,although FIG. 34 illustrates an exemplary embodiment in which thestandard cell SC includes three conductive lines CL, exemplaryembodiments of the inventive concept are not limited thereto. Forexample, in an exemplary embodiment, the standard cell SC may include atleast four conductive lines, which may extend in the second directionand be arranged substantially parallel to one another in the firstdirection.

The plurality of contacts CA may be arranged on the first and secondactive regions AR1 and AR2 and electrically connected to the first andsecond active regions AR1 and AR2. In an exemplary embodiment, theplurality of contacts CA may be source/drain contacts. In an exemplaryembodiment, the plurality of contacts CA may be power contacts. Thestandard cell SC may further include contacts, which may be arranged onthe plurality of conductive lines CL and electrically connected to theplurality of conductive lines CL.

FIG. 35 is a perspective view of an example of a semiconductor devicehaving a layout of FIG. 34 according to an exemplary embodiment of theinventive concept. FIG. 36 is a cross-sectional view taken along lineA-A′ of FIG. 34 according to an exemplary embodiment of the inventiveconcept.

Referring to FIGS. 35 and 36, a semiconductor device 100 a may be abulk-type fin field-effect transistor (FinFET). The semiconductor device100 a may include, for example, a substrate SUB, a first insulatinglayer IL1, a second insulating layer IL2, first to third fins FN, and aconductive line CL. The conductive line CL may also be referred toherein as a gate electrode CL.

The substrate SUB may be a semiconductor substrate. For example, thesemiconductor substrate SUB may include any one of silicon,silicon-on-insulator (SOI), silicon-on-sapphire, germanium (Ge), silicongermanium (SiGe), and gallium arsenic (GaAs). The substrate SUB may be,for example, a P-type substrate and used as a first active region AR1.

The first to third fins FN may be connected to the substrate SUB. In anexemplary embodiment, the first to third fins FN may be active regionsformed by doping an n+-type dopant or a p+-type dopant into portionsvertically protruding from the substrate SUB.

The first and second insulating layers IL1 and IL2 may include aninsulating material. For example, the insulating material may includeany one of an oxide layer, a nitride layer, or an oxynitride layer. Thefirst insulating layer IL1 may be arranged on the first to third finsFN. The first insulating layer IL1 may be arranged between the first tothird fins FN and the gate electrode CL and used as a gate insulatinglayer. The second insulating layer IL2 may be disposed at apredetermined height in spaces among the first to third fins FN. Thesecond insulating layer 1L2 may be arranged among the first to thirdfins FN and used as a device isolation layer.

The gate electrode CL may be arranged on the first and second insulatinglayers IL1 and IL2. Thus, the gate electrode CL may be configured tosurround an upper portion of the first to third fins FN, the firstinsulating layer IL1, and the second insulating layer IL2, as shown inFIG. 36. That is, in an exemplary embodiment the first to third fins FNmay be arranged inside the gate electrode CL (e.g., the gate electrodeCL may be disposed on an upper portion of the first to third fins FN,the first insulating layer IL1, and the second insulating layer IL2).The gate electrode CL may include a metal material (e.g., tungsten (W)and tantalum (Ta)), a nitride thereof, a silicon thereof, or dopedpoly-Si, and may be formed using a deposition process.

FIG. 37 is a perspective view of an example of a semiconductor devicehaving the layout of FIG. 34 according to an exemplary embodiment of theinventive concept. FIG. 38 is a cross-sectional view taken along lineA-A′ of FIG. 37 according to an exemplary embodiment of the inventiveconcept.

Referring to FIGS. 37 and 38, a semiconductor device 100 b may be aSOI-type FinFET. The semiconductor device 100 b may include a substrateSUB′, a first insulating layer IL1′, a second insulating layer IL2′,first to third fins FN′, and a conductive line CL′. The conductive lineCL′ may also be referred to herein as a gate electrode CL′. Thesemiconductor device 100 b according to the present exemplary embodimentis a modified example of the semiconductor device 100 a shown in FIGS.35 and 36. Thus, for convenience of explanation, only differencesbetween the semiconductor device 100 b and the semiconductor device 100a may be described, and processes and elements previously described maybe omitted herein.

The first insulating layer IL1′ may be arranged on the substrate SUB′.The second insulating layer 1L2′ may be arranged between the first tothird fins FN′ and the gate electrode CL′ and used as a gate insulatinglayer. The first to third fins FN′ may include a semiconductor materialsuch as, for example, silicon or doped silicon.

The gate electrode CL′ may be arranged on the second insulating layerIL2′. Thus, the gate electrode CL′ may be configured to surround anupper portion of the first to third fins FN′ and the second insulatinglayer IL2′. That is, in an exemplary embodiment, the first and secondfins FN′ may be arranged inside the gate electrode CL′ (e.g., the gateelectrode CL′ may be disposed on an upper portion of the first to thirdfins FN′ and the second insulating layer IL2′).

FIG. 39 is a block diagram of a storage medium according to an exemplaryembodiment of the inventive concept.

Referring to FIG. 39, the storage medium 500 may be a computer-readablestorage medium, which may include an arbitrary computer-readable storagemedium while being used to provide commands and/or data to a computer.For example, the storage medium 500 may include a magnetic or opticalmedium (e.g., a disc, a tape, a CD-ROM, a DVD-ROM, a CD-R, a CD-RW, aDVD-R, and a DVD-RW), a volatile or non-volatile memory (e.g., a randomaccess memory (RAM), a read-only memory (ROM), or a flash memory), anon-volatile memory that is accessible via a universal serial bus (USB)interface, and/or a micro electro mechanical systems (MEMS). The storagemedium 500 may be inserted into a computer, integrated in a computer, orcombined with a computer via a network and/or a communication medium,such as a wireless link.

Exemplary embodiments of the present inventive concept may be embodieddirectly in hardware, in a software module executed by a processor, orin a combination of the two. A software module may be tangibly embodiedon a non-transitory program storage device such as, for example, in RAMmemory, flash memory, ROM memory, EPROM memory, EEPROM memory,registers, a hard disk, a removable disk, a CD-ROM, or any other form ofstorage medium known in the art. An exemplary storage medium may becoupled to the processor, such that the processor can read informationfrom, and write information to, the storage medium. In the alternative,the storage medium may be integral to the processor. Further, in someaspects, the processor and the storage medium may reside in anapplication specific integrated circuit (ASIC). Additionally, the ASICmay reside in a user terminal. Alternatively, the processor and thestorage medium may reside as discrete components in a user terminal.

It is to be understood that the present inventive concept may beimplemented in various forms of hardware, software, firmware, specialpurpose processors, or a combination thereof. In one embodiment, thepresent inventive concept may be implemented in software as anapplication program tangibly embodied on a program storage device. Theapplication program may be uploaded to, and executed by, a machinecomprising any suitable architecture.

As shown in FIG. 39, the storage medium 500 may include a P&R program510, a library 520, an analyzing program 530, and a data structure 540.The P&R program 510 may include a plurality of commands to perform amethod of designing an IC using a standard cell library according toexemplary embodiments of the inventive concept described herein. Forexample, the storage medium 500 may store the P&R program 510 includingarbitrary commands for designing an IC using a standard cell libraryincluding a standard cell shown in at least one of FIGS. 1 to 38. Thelibrary 520 may include information regarding a standard cell, which isa unit of an IC.

The analyzing program 530 may include a plurality of commands to performa method of analyzing an IC based on data defining the IC. The datastructure 540 may include a storage space for managing data generatedduring a process of using a standard cell library included in thelibrary 520, a process of extracting specific information from a generalstandard cell library included in the library 520, or a process ofanalyzing characteristics of the IC using the analyzing program 530.

FIG. 40 is a block diagram of a memory card including an IC according toan exemplary embodiment of the inventive concept.

Referring to FIG. 40, a memory card 1000 may be configured such that thecontroller 1100 and the memory 1200 exchange electric signals. Forexample, when the controller 1100 issues a command, the memory 1200 maytransmit data.

Each of the controller 1100 and the memory 1200 may include an ICaccording to exemplary embodiments of the inventive concept describedherein. In an exemplary embodiment, at least one of a plurality ofsemiconductor devices included in the controller 1100 and the memory1200 may be embodied according to an IC including a cell in which atleast two patterns adjacent to a boundary have different colors anddifferent boundary spaces. In an exemplary embodiment, at least one ofthe plurality of semiconductor devices included in the controller 1100and the memory 1200 may be embodied according to an IC including a cellhaving colorless patterns that satisfy a first space condition in onezone adjacent to a boundary.

The memory card 1000 may constitute various kinds of memory cards suchas, for example, a memory stick card, a smart media (SM) card, a securedigital (SD) card, a mini-SD card, and a multimedia card (MMC).

FIG. 41 is a block diagram of a computing system including an ICaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 41, a computing system 2000 may include a processor2100, a memory device 2200, a storage device 2300, a power supply 2400,and an input/output (I/O) device 2500. The computing system 2000 maycommunicate with a video card, a sound card, a memory card, or a USBdevice, or may further include ports capable of communicating with otherelectronic devices.

Each of the processor 2100, the memory device 2200, the storage device2300, the power supply 2400, and the I/O device 2500 included in thecomputing system 2000 may include an IC according to one of theexemplary embodiments of the inventive concept described herein. In anexemplary embodiment, at least one of a plurality of semiconductordevices included in the processor 2100, the memory device 2200, thestorage device 2300, the power supply 2400, and the I/O device 2500 maybe embodied according to an IC including a cell in which two patternsadjacent to a boundary have different colors and different boundaryspaces. In an exemplary embodiment, at least one of a plurality ofsemiconductor devices included in the processor 2100, the memory device2200, the storage device 2300, the power supply 2400, and the I/O device2500 may be embodied according to an IC including a cell havingcolorless patterns that satisfy a first space condition in one zoneadjacent to a boundary.

The processor 2100 may perform specific calculations or tasks. Inexemplary embodiments, the processor 2100 may be a microprocessor (MP)or a central processing unit (CPU). The processor 2100 may communicatewith the memory device 2200, the storage device 2300, and the I/O device2500 via a bus 2600, such as an address bus, a control bus, or a databus. In exemplary embodiments, the processor 2100 may be connected to anexpansion bus, such as a peripheral component interconnect (PCI) bus.

The memory device 2200 may store data required for operations of thecomputing system 2000. For example, the memory device 2200 may beembodied by dynamic RAM (DRAM), mobile DRAM (MDRAM), static RAM (SRAM),phase-change RAM (PRAM), ferroelectric RAM (FRAM), resistive RAM (RRAM),and/or magnetic RAM (MRAM). The storage device 2300 may include asolid-state drive (SSD), a hard disk drive, or CD-ROM.

The I/O device 2500 may include an input unit, such as a keyboard, akeypad, or a mouse, and an output unit, such as printer or a display.The power supply 2400 may supply an operating voltage required foroperations of the computing system 2000.

The IC according to one of the above-described exemplary embodiments ofthe inventive concept may be embodied using packages having variousshapes. For example, at least some elements of the IC according to oneof the above-described exemplary embodiments may be mounted using aPackage on Package (PoP) technique, a ball grid array (BGA) technique, achip-scale package (CSP) technique, a plastic-leaded chip carrier (PLCC)technique, a plastic dual in-line package (PDIP) technique, adie-in-waffle-pack technique, a die-in-wafer-form technique, achip-on-board (COB) technique, a ceramic dual in-line package (CERDIP)technique, a plastic metric quad flat-pack (MQFP) technique, a thin quadflat-pack (TQFP) technique, a small outline integrated circuit (SOIC)technique, a shrink small outline package (SSOP) technique, a thin smalloutline package (TSOP) technique, a system-in-package (SIP) technique, amulti-chip package (MCP) technique, a wafer-level fabricated package(WFP) technique, or a wafer-level processed stack package (WSP)technique.

While the present inventive concept has been particularly shown anddescribed with reference to the exemplary embodiments thereof, it willbe understood by those of ordinary skill in the art that various changesin form and detail may be made therein without departing from the spiritand scope of the present inventive concept as defined by the followingclaims.

What is claimed is:
 1. A method of designing a layout of an integratedcircuit (IC), comprising: placing a first cell in the layout, whereinthe first cell comprises a plurality of first colorless patterns, eachsatisfying a first space condition, wherein the first space conditioncorresponds to a value of a smallest space between patterns to which asame color is assigned in a first zone adjacent to a first boundary, thefirst zone extending substantially parallel to the first boundary;placing a second cell in the layout adjacent to the first cell at thefirst boundary between the first and second cells; and generating aplurality of commands executable by a processor to form a semiconductordevice based on the layout, wherein the second cell comprises aplurality of third colorless patterns, each satisfying a second spacecondition, wherein the second space condition corresponds to a value ofa smallest space between patterns to which a same color is assigned in athird zone adjacent to a third boundary, the third zone extendingsubstantially parallel to the third boundary.
 2. The method of claim 1,wherein the first cell does not comprise patterns that have differentcolors and are at a same level as the first colorless patterns in thefirst zone.
 3. The method of claim 1, further comprising: assigning afirst color to the first colorless patterns subsequent to placing thefirst and second cells.
 4. The method of claim 1, wherein the firstcolorless patterns correspond to via plugs.
 5. The method of claim 1,wherein the first cell further comprises a plurality of second colorlesspatterns disposed in a second zone adjacent to a second boundaryopposite the first boundary, and the second colorless patterns satisfythe first space condition.
 6. The method of claim 5, further comprising:assigning a first color to the first colorless patterns subsequent toplacing the first and second cells; and assigning a second color to thesecond colorless patterns subsequent to placing the first and secondcells.
 7. The method of claim 5, further comprising: assigning a firstcolor to the first colorless patterns and the second colorless patternssubsequent to placing the first and second cells.
 8. The method of claim5, wherein the second colorless patterns correspond to via plugs.
 9. Themethod of claim 1, further comprising: assigning a first color to thefirst colorless patterns subsequent to placing the first and secondcells; and assigning a second color to the third colorless patternssubsequent to placing the first and second cells.
 10. The method ofclaim 1, further comprising: assigning a first color to the firstcolorless patterns and the third colorless patterns subsequent toplacing the first and second cells.
 11. The method of claim 1, whereinthe third colorless patterns correspond to via plugs.
 12. The method ofclaim 1, wherein the first boundary substantially overlaps one boundaryof the second cell.
 13. The method of claim 1, wherein the second cellis placed a predetermined space apart from the first boundary.
 14. Astandard cell stored in a standard cell library, comprising: a pluralityof first colorless patterns disposed in a first zone of the standardcell adjacent to a first boundary, wherein each first colorless patternsatisfies a first space condition; and a plurality of second colorlesspatterns disposed in a second zone of the standard cell adjacent to asecond boundary opposite to the first boundary, wherein each secondcolorless pattern satisfies the first space condition, wherein the firstspace condition corresponds to a value of a smallest space betweenpatterns to which a same color is assigned in the first zone, whereinpatterns disposed in the standard cell other than the first and secondcolorless patterns satisfy a second space condition different from thefirst space conditions, wherein the second space condition correspondsto a value of a smallest space between patterns to which a differentcolor is assigned.
 15. The standard cell of claim 14, wherein the firstcolorless patterns or the second colorless patterns correspond to viaplugs.
 16. A method of manufacturing a semiconductor device, comprising:placing a first cell in a layout, wherein the first cell comprises aplurality of first colorless patterns, each satisfying a first spacecondition, wherein the first space condition corresponds to a value of asmallest space between patterns to which a same color is assigned in afirst zone adjacent to a first boundary, the first zone extendingsubstantially parallel to the first boundary; placing a second cell inthe layout adjacent to the first cell at the first boundary between thefirst and second cells, wherein the second cell comprises a plurality ofthird colorless patterns, each satisfying a second space condition,wherein the second space condition corresponds to a value of a smallestspace between patterns to which a same color is assigned in a third zoneadjacent to a third boundary, the third zone extending substantiallyparallel to the third boundary, wherein the first and second cells areamong a plurality of cells that defines an integrated circuit (IC); andforming the semiconductor device based on the layout, wherein thesemiconductor device is formed using a multi-patterning operationperformed on the first colorless patterns to which a first color isassigned and the third colorless patterns to which a second color isassigned using first and second masks corresponding respectively to thefirst and second colors.
 17. The method of claim 16, wherein the firstcell further comprises a plurality of second colorless patterns disposedin a second zone adjacent to a second boundary opposite the firstboundary, and the second colorless patterns satisfy the first spacecondition.
 18. The method of claim 16, wherein the first color is thesame as the second color.
 19. The method of claim 16, wherein the firstcolor is different from the second color.
 20. The method of claim 16,wherein the first colorless patterns or the third colorless patternscorrespond to via plugs.